Other articles related with "MOSFET":
118502 Jin-Ping Zhang(张金平), Wei Chen(陈伟), Zi-Xun Chen(陈子珣), and Bo Zhang(张波)
  SiC trench MOSFET with dual shield gate and optimized JFET layer for improved dynamic performance and safe operating area capability
    Chin. Phys. B   2023 Vol.32 (11): 118502-118502 [Abstract] (104) [HTML 0 KB] [PDF 947 KB] (47)
108503 Hong Zhang(张鸿), Hong-Xia Guo(郭红霞), Zhi-Feng Lei(雷志锋), Chao Peng(彭超), Wu-Ying Ma(马武英), Di Wang(王迪), Chang-Hao Sun(孙常皓), Feng-Qi Zhang(张凤祁), Zhan-Gang Zhang(张战刚), Ye Yang(杨业), Wei Lv(吕伟), Zhong-Ming Wang(王忠明), Xiang-Li Zhong(钟向丽), and Xiao-Ping Ouyang(欧阳晓平)
  Proton induced radiation effect of SiC MOSFET under different bias
    Chin. Phys. B   2023 Vol.32 (10): 108503-108503 [Abstract] (91) [HTML 0 KB] [PDF 1463 KB] (20)
98501 Yi-Fan Li(李逸帆), Tao Ni(倪涛), Xiao-Jing Li(李晓静), Juan-Juan Wang(王娟娟), Lin-Chun Gao(高林春), Jian-Hui Bu(卜建辉), Duo-Li Li(李多力), Xiao-Wu Cai(蔡小五), Li-Da Xu(许立达), Xue-Qin Li(李雪勤), Run-Jian Wang(王润坚), Chuan-Bin Zeng(曾传滨), Bo Li(李博), Fa-Zhan Zhao(赵发展), Jia-Jun Luo(罗家俊), and Zheng-Sheng Han(韩郑生)
  Analytical workload dependence of self-heating effect for SOI MOSFETs considering two-stage heating process
    Chin. Phys. B   2023 Vol.32 (9): 98501-098501 [Abstract] (118) [HTML 0 KB] [PDF 2406 KB] (21)
68502 Rongxing Cao(曹荣幸), Kejia Wang(汪柯佳), Yang Meng(孟洋), Linhuan Li(李林欢), Lin Zhao(赵琳), Dan Han(韩丹), Yang Liu(刘洋), Shu Zheng(郑澍), Hongxia Li(李红霞), Yuqi Jiang(蒋煜琪), Xianghua Zeng(曾祥华), and Yuxiong Xue(薛玉雄)
  Synergistic effect of total ionizing dose on single-event gate rupture in SiC power MOSFETs
    Chin. Phys. B   2023 Vol.32 (6): 68502-068502 [Abstract] (172) [HTML 0 KB] [PDF 1436 KB] (78)
67303 Weizhong Chen(陈伟中), Liuting Mou(牟柳亭), Haifeng Qin(秦海峰), Hongsheng Zhang(张红升), and Zhengsheng Han(韩郑生)
  An integrated split and dummy gates MOSFET with fast turn-off and reverse recovery characteristics
    Chin. Phys. B   2023 Vol.32 (6): 67303-067303 [Abstract] (212) [HTML 0 KB] [PDF 1840 KB] (176)
58501 Pei Shen(沈培), Ying Wang(王颖), Xing-Ji Li(李兴冀), Jian-Qun Yang(杨剑群), and Fei Cao(曹菲)
  Low switching loss and increased short-circuit capability split-gate SiC trench MOSFET with p-type pillar
    Chin. Phys. B   2023 Vol.32 (5): 58501-058501 [Abstract] (191) [HTML 0 KB] [PDF 2419 KB] (82)
58504 Kaizhe Jiang(蒋铠哲), Xiaodong Zhang(张孝冬), Chuan Tian(田川), Shengrong Zhang(张升荣),Liqiang Zheng(郑理强), Rongzhao He(赫荣钊), and Chong Shen(沈重)
  A SiC asymmetric cell trench MOSFET with a split gate and integrated p+-poly Si/SiC heterojunction freewheeling diode
    Chin. Phys. B   2023 Vol.32 (5): 58504-058504 [Abstract] (179) [HTML 1 KB] [PDF 1406 KB] (266)
57305 Wen-Hao Zhang(张文浩), Ma-Guang Zhu(朱马光), Kang-Hua Yu(余康华), Cheng-Zhan Li(李诚瞻),Jun Wang(王俊), Li Xiang(向立), and Yu-Wei Wang(王雨薇)
  Impact of low-dose radiation on nitrided lateral 4H-SiC MOSFETs and the related mechanisms
    Chin. Phys. B   2023 Vol.32 (5): 57305-057305 [Abstract] (168) [HTML 1 KB] [PDF 917 KB] (185)
37302 Meixia Cheng(程梅霞), Suzhen Luan(栾苏珍), Hailin Wang(王海林), and Renxu Jia(贾仁需)
  Design and research of normally-off β-Ga2O3/4H-SiC heterojunction field effect transistor
    Chin. Phys. B   2023 Vol.32 (3): 37302-037302 [Abstract] (284) [HTML 1 KB] [PDF 867 KB] (231)
28504 Hong Zhang(张鸿), Hongxia Guo(郭红霞), Zhifeng Lei(雷志锋), Chao Peng(彭超), Zhangang Zhang(张战刚), Ziwen Chen(陈资文), Changhao Sun(孙常皓), Yujuan He(何玉娟), Fengqi Zhang(张凤祁), Xiaoyu Pan(潘霄宇), Xiangli Zhong(钟向丽), and Xiaoping Ouyang(欧阳晓平)
  Experiment and simulation on degradation and burnout mechanisms of SiC MOSFET under heavy ion irradiation
    Chin. Phys. B   2023 Vol.32 (2): 28504-028504 [Abstract] (265) [HTML 1 KB] [PDF 1582 KB] (101)
28503 Jie Wei(魏杰), Qinfeng Jiang(姜钦峰), Xiaorong Luo(罗小蓉), Junyue Huang(黄俊岳), Kemeng Yang(杨可萌), Zhen Ma(马臻), Jian Fang(方健), and Fei Yang(杨霏)
  High performance SiC trench-type MOSFET with an integrated MOS-channel diode
    Chin. Phys. B   2023 Vol.32 (2): 28503-028503 [Abstract] (331) [HTML 0 KB] [PDF 1793 KB] (301)
98502 Xinxin Zuo(左欣欣), Jiang Lu(陆江), Xiaoli Tian(田晓丽), Yun Bai(白云), Guodong Cheng(成国栋), Hong Chen(陈宏), Yidan Tang(汤益丹), Chengyue Yang(杨成樾), and Xinyu Liu(刘新宇)
  Improvement on short-circuit ability of SiC super-junction MOSFET with partially widened pillar structure
    Chin. Phys. B   2022 Vol.31 (9): 98502-098502 [Abstract] (303) [HTML 0 KB] [PDF 1544 KB] (151)
97303 Chenkai Zhu(朱晨凯), Linna Zhao(赵琳娜), Zhuo Yang(杨卓), and Xiaofeng Gu(顾晓峰)
  Degradation and breakdown behaviors of SGTs under repetitive unclamped inductive switching avalanche stress
    Chin. Phys. B   2022 Vol.31 (9): 97303-097303 [Abstract] (316) [HTML 0 KB] [PDF 3307 KB] (83)
97401 Cheng-Yu Huang(黄成玉), Jin-Yan Wang(王金延), Bin Zhang(张斌), Zhen Fu(付振), Fang Liu(刘芳), Mao-Jun Wang(王茂俊), Meng-Jun Li(李梦军), Xin Wang(王鑫), Chen Wang(汪晨), Jia-Yin He(何佳音), and Yan-Dong He(何燕冬)
  Physical analysis of normally-off ALD Al2O3/GaN MOSFET with different substrates using self-terminating thermal oxidation-assisted wet etching technique
    Chin. Phys. B   2022 Vol.31 (9): 97401-097401 [Abstract] (317) [HTML 0 KB] [PDF 1088 KB] (87)
78501 Pei Shen(沈培), Ying Wang(王颖), and Fei Cao(曹菲)
  A 4H-SiC trench MOSFET structure with wrap N-type pillar for low oxide field and enhanced switching performance
    Chin. Phys. B   2022 Vol.31 (7): 78501-078501 [Abstract] (389) [HTML 1 KB] [PDF 1551 KB] (133)
18504 Sheng-Long Ran(冉胜龙), Zhi-Yong Huang(黄智勇), Sheng-Dong Hu(胡盛东), Han Yang(杨晗), Jie Jiang(江洁), and Du Zhou(周读)
  A 3D SiC MOSFET with poly-silicon/SiC heterojunction diode
    Chin. Phys. B   2022 Vol.31 (1): 18504-018504 [Abstract] (475) [HTML 1 KB] [PDF 733 KB] (194)
18501 Hong Zhang(张鸿), Hong-Xia Guo(郭红霞), Feng-Qi Zhang(张凤祁), Xiao-Yu Pan(潘霄宇), Yi-Tian Liu(柳奕天), Zhao-Qiao Gu(顾朝桥), An-An Ju(琚安安), and Xiao-Ping Ouyang(欧阳晓平)
  Sensitivity of heavy-ion-induced single event burnout in SiC MOSFET
    Chin. Phys. B   2022 Vol.31 (1): 18501-018501 [Abstract] (544) [HTML 0 KB] [PDF 2029 KB] (161)
87305 Ruo-Han Li(李若晗), Wu-Xiong Fei(费武雄), Rui Tang(唐锐), Zhao-Xi Wu(吴照玺), Chao Duan(段超), Tao Zhang(张涛), Dan Zhu(朱丹), Wei-Hang Zhang(张苇杭), Sheng-Lei Zhao(赵胜雷), Jin-Cheng Zhang(张进成), and Yue Hao(郝跃)
  Investigation on threshold voltage of p-channel GaN MOSFETs based on p-GaN/AlGaN/GaN heterostructure
    Chin. Phys. B   2021 Vol.30 (8): 87305-087305 [Abstract] (492) [HTML 1 KB] [PDF 830 KB] (158)
67303 Jie Xu(许杰), Nai-Long He(何乃龙), Hai-Lian Liang(梁海莲), Sen Zhang(张森), Yu-De Jiang(姜玉德), and Xiao-Feng Gu(顾晓峰)
  Terminal-optimized 700-V LDMOS with improved breakdown voltage and ESD robustness
    Chin. Phys. B   2021 Vol.30 (6): 67303-067303 [Abstract] (471) [HTML 0 KB] [PDF 1025 KB] (111)
58101 Yu Fu(付裕), Rui-Min Xu(徐锐敏), Xin-Xin Yu(郁鑫鑫), Jian-Jun Zhou(周建军), Yue-Chan Kong(孔月婵), Tang-Sheng Chen(陈堂胜), Bo Yan(延波), Yan-Rong Li(李言荣), Zheng-Qiang Ma(马正强), and Yue-Hang Xu(徐跃杭)
  Enhanced interface properties of diamond MOSFETs with Al2O3 gate dielectric deposited via ALD at a high temperature
    Chin. Phys. B   2021 Vol.30 (5): 58101-058101 [Abstract] (552) [HTML 1 KB] [PDF 1096 KB] (97)
58502 Pei Shen(沈培), Ying Wang(王颖), Xing-Ji Li(李兴冀), Jian-Qun Yang(杨剑群), Cheng-Hao Yu(于成浩), and Fei Cao(曹菲)
  Improved 4H-SiC UMOSFET with super-junction shield region
    Chin. Phys. B   2021 Vol.30 (5): 58502-058502 [Abstract] (540) [HTML 1 KB] [PDF 1030 KB] (169)
48504 Xi-Ming Chen(陈喜明), Bang-Bing Shi(石帮兵), Xuan Li(李轩), Huai-Yun Fan(范怀云), Chen-Zhan Li(李诚瞻), Xiao-Chuan Deng(邓小川), Hai-Hui Luo(罗海辉), Yu-Dong Wu(吴煜东), and Bo Zhang(张波)
  Characteristics and mechanisms of subthreshold voltage hysteresis in 4H-SiC MOSFETs
    Chin. Phys. B   2021 Vol.30 (4): 48504- [Abstract] (439) [HTML 1 KB] [PDF 790 KB] (149)
37301 Xin-Yu Liu(刘新宇), Ji-Long Hao(郝继龙), Nan-Nan You(尤楠楠), Yun Bai(白云), Yi-Dan Tang(汤益丹), Cheng-Yue Yang(杨成樾), Sheng-Kai Wang(王盛凯)
  High-mobility SiC MOSFET with low density of interface traps using high pressure microwave plasma oxidation
    Chin. Phys. B   2020 Vol.29 (3): 37301-037301 [Abstract] (766) [HTML 1 KB] [PDF 1104 KB] (246)
38505 Xian-Le Zhang(张先乐), Peng-Ying Chang(常鹏鹰), Gang Du(杜刚), Xiao-Yan Liu(刘晓彦)
  Role of remote Coulomb scattering on the hole mobility at cryogenic temperatures in SOI p-MOSFETs
    Chin. Phys. B   2020 Vol.29 (3): 38505-038505 [Abstract] (484) [HTML 1 KB] [PDF 667 KB] (119)
58503 Zhi-Gang Wang(汪志刚), Tao Liao(廖涛), Ya-Nan Wang(王亚南)
  Modeling electric field of power metal-oxide-semiconductor field-effect transistor with dielectric trench based on Schwarz-Christoffel transformation
    Chin. Phys. B   2019 Vol.28 (5): 58503-058503 [Abstract] (660) [HTML 1 KB] [PDF 1019 KB] (212)
27201 Jun Wang(王军), Xiao-Mei Peng(彭小梅), Zhi-Jun Liu(刘志军), Lin Wang(王林), Zhen Luo(罗震), Dan-Dan Wang(王丹丹)
  Observation of nonconservation characteristics of radio frequency noise mechanism of 40-nm n-MOSFET
    Chin. Phys. B   2018 Vol.27 (2): 27201-027201 [Abstract] (781) [HTML 0 KB] [PDF 2011 KB] (204)
127302 Yan-Bing Xu(徐雁冰), Hong-Guan Yang(杨红官)
  Capacitance extraction method for a gate-induced quantum dot in silicon nanowire metal-oxide-semiconductor field-effect transistors
    Chin. Phys. B   2017 Vol.26 (12): 127302-127302 [Abstract] (515) [HTML 0 KB] [PDF 886 KB] (206)
98901 Norazlina M S, Dheepan Chakravarthii M K, Shanmugan S, Mutharasu D, Shahrom Mahmud
  Heat transfer enhancement in MOSFET mounted on different FR4 substrates by thermal transient measurement
    Chin. Phys. B   2017 Vol.26 (9): 98901-098901 [Abstract] (538) [HTML 1 KB] [PDF 3119 KB] (538)
88101 Wang Zhang(张望), Wei-Hua Han(韩伟华), Xiao-Song Zhao(赵晓松), Qi-Feng Lv(吕奇峰), Xiang-Hai Ji(季祥海), Tao Yang(杨涛), Fu-Hua Yang(杨富华)
  Horizontal InAs nanowire transistors grown on patterned silicon-on-insulator substrate
    Chin. Phys. B   2017 Vol.26 (8): 88101-088101 [Abstract] (582) [HTML 1 KB] [PDF 1726 KB] (191)
47306 Wei Mao(毛维), Hai-Yong Wang(王海永), Xiao-Fei Wang(王晓飞), Ming Du(杜鸣), Jin-Feng Zhang(张金风), Xue-Feng Zheng(郑雪峰), Chong Wang(王冲), Xiao-Hua Ma(马晓华), Jin-Cheng Zhang(张进成), Yue Hao(郝跃)
  Improvement of reverse blocking performance in vertical power MOSFETs with Schottky-drain-connected semisuperjunctions
    Chin. Phys. B   2017 Vol.26 (4): 47306-047306 [Abstract] (766) [HTML 1 KB] [PDF 9012 KB] (379)
108503 Shweta Tripathi
  A two-dimensional analytical modeling for channel potential and threshold voltage of short channel triple material symmetrical gate Stack (TMGS) DG-MOSFET
    Chin. Phys. B   2016 Vol.25 (10): 108503-108503 [Abstract] (581) [HTML 1 KB] [PDF 5433 KB] (674)
38502 Yan-hui Xin(辛艳辉), Sheng Yuan(袁胜), Ming-tang Liu(刘明堂),Hong-xia Liu(刘红侠), He-cai Yuan(袁合才)
  Two-dimensional models of threshold voltage andsubthreshold current for symmetrical double-material double-gate strained Si MOSFETs
    Chin. Phys. B   2016 Vol.25 (3): 38502-038502 [Abstract] (677) [HTML 1 KB] [PDF 339 KB] (303)
78502 Chen Hai-Feng (陈海峰), Guo Li-Xin (过立新), Zheng Pu-Yang (郑璞阳), Dong Zhao (董钊), Zhang Qian (张茜)
  Characteristics of drain-modulated generation current in n-type metal-oxide-semiconductor field-effect transistor
    Chin. Phys. B   2015 Vol.24 (7): 78502-078502 [Abstract] (730) [HTML 1 KB] [PDF 364 KB] (302)
47302 Morteza Charmi
  Novel attributes and design considerations of effective oxide thickness in nano DG MOSFETs
    Chin. Phys. B   2015 Vol.24 (4): 47302-047302 [Abstract] (631) [HTML 0 KB] [PDF 412 KB] (404)
128502 Chen Hai-Feng (陈海峰)
  Gate-modulated generation–recombination current in n-type metal–oxide–semiconductor field-effect transistor
    Chin. Phys. B   2014 Vol.23 (12): 128502-128502 [Abstract] (538) [HTML 1 KB] [PDF 368 KB] (400)
118505 Shweta Tripathi
  A two-dimensional analytical model for channel potential and threshold voltage of short channel dual material gate lightly doped drain MOSFET
    Chin. Phys. B   2014 Vol.23 (11): 118505-118505 [Abstract] (615) [HTML 1 KB] [PDF 332 KB] (433)
90702 Peng Chao (彭超), Hu Zhi-Yuan (胡志远), Ning Bing-Xu (宁冰旭), Huang Hui-Xiang (黄辉祥), Fan Shuang (樊双), Zhang Zheng-Xuan (张正选), Bi Da-Wei (毕大炜), En Yun-Fei (恩云飞)
  Utilizing a shallow trench isolation parasitic transistor to characterize the total ionizing dose effect of partially-depleted silicon-on-insulator input/output n-MOSFETs
    Chin. Phys. B   2014 Vol.23 (9): 90702-090702 [Abstract] (529) [HTML 1 KB] [PDF 531 KB] (1018)
67701 Lin Meng (林猛), An Xia (安霞), Li Ming (黎明), Yun Quan-Xin (云全新), Li Min (李敏), Li Zhi-Qiang (李志强), Liu Peng-Qiang (刘朋强), Zhang Xing (张兴), Huang Ru (黄如)
  Fabricating GeO2 passivation layer by N2O plasma oxidation for Ge NMOSFETs application
    Chin. Phys. B   2014 Vol.23 (6): 67701-067701 [Abstract] (502) [HTML 1 KB] [PDF 410 KB] (712)
57304 Zhang Yue (张月), Zhuo Qing-Qing (卓青青), Liu Hong-Xia (刘红侠), Ma Xiao-Hua (马晓华), Hao Yue (郝跃)
  Flat-roof phenomenon of dynamic equilibrium phase in the negative bias temperature instability effect on a power MOSFET
    Chin. Phys. B   2014 Vol.23 (5): 57304-057304 [Abstract] (535) [HTML 1 KB] [PDF 303 KB] (388)
38503 Wu Wei (伍伟), Zhang Bo (张波), Luo Xiao-Rong (罗小蓉), Fang Jian (方健), Li Zhao-Ji (李肇基)
  Low on-resistance high-voltage lateral double-diffused metal oxide semiconductor with a buried improved super-junction layer
    Chin. Phys. B   2014 Vol.23 (3): 38503-038503 [Abstract] (519) [HTML 1 KB] [PDF 749 KB] (611)
38502 Li Cong (李聪), Zhuang Yi-Qi (庄奕琪), Zhang Li (张丽), Jin Gang (靳刚)
  A two-dimensional analytical subthreshold behavior model for junctionless dual-material cylindrical surrounding-gate MOSFETs
    Chin. Phys. B   2014 Vol.23 (3): 38502-038502 [Abstract] (477) [HTML 1 KB] [PDF 514 KB] (491)
18501 Li Cong (李聪), Zhuang Yi-Qi (庄奕琪), Zhang Li (张丽), Jin Gang (靳刚)
  Quasi-two-dimensional threshold voltage model for junctionless cylindrical surrounding gate metal-oxide-semiconductor field-effect transistor with dual-material gate
    Chin. Phys. B   2014 Vol.23 (1): 18501-018501 [Abstract] (544) [HTML 1 KB] [PDF 358 KB] (552)
107302 Xue Bai-Qing (薛百清), Wang Sheng-Kai (王盛凯), Han Le (韩乐), Chang Hu-Dong (常虎东), Sun Bing (孙兵), Zhao Wei (赵威), Liu Hong-Gang (刘洪刚)
  High-mobility germanium p-MOSFETs by using HCl and (NH4)2S surface passivation
    Chin. Phys. B   2013 Vol.22 (10): 107302-107302 [Abstract] (540) [HTML 1 KB] [PDF 502 KB] (578)
98502 Zahra Ahangari, Morteza Fathipour
  Tight-binding study of quantum transport in nanoscale GaAs Schottky MOSFET
    Chin. Phys. B   2013 Vol.22 (9): 98502-098502 [Abstract] (599) [HTML 1 KB] [PDF 838 KB] (633)
47304 Lei Xiao-Yi (雷晓艺), Liu Hong-Xia (刘红侠), Zhang Kai (张凯), Zhang Yue (张月), Zheng Xue-Feng (郑雪峰), Ma Xiao-Hua (马晓华), Hao Yue (郝跃)
  Hot carrier degradation and a new lifetime prediction model in ultra-deep sub-micron pMOSFET
    Chin. Phys. B   2013 Vol.22 (4): 47304-047304 [Abstract] (842) [HTML 1 KB] [PDF 320 KB] (875)
27302 Song Qing-Wen (宋庆文), Zhang Yu-Ming (张玉明), Han Ji-Sheng (韩吉胜), Philip Tanner, Sima Dimitrijev, Zhang Yi-Men (张义门), Tang Xiao-Yan (汤晓燕), Guo Hui (郭辉)
  The fabrication and characterization of 4H SiC power UMOSFETs
    Chin. Phys. B   2013 Vol.22 (2): 27302-027302 [Abstract] (1085) [HTML 1 KB] [PDF 441 KB] (1558)
28503 Wang Bin (王斌), Zhang He-Ming (张鹤鸣), Hu Hui-Yong (胡辉勇), Zhang Yu-Ming (张玉明), Zhou Chun-Yu (周春宇), Wang Guan-Yu (王冠宇), Li Yu-Chen (李妤晨 )
  Effect of substrate doping on the flatband and threshold voltages of strained-Si pMOSFET
    Chin. Phys. B   2013 Vol.22 (2): 28503-028503 [Abstract] (801) [HTML 1 KB] [PDF 390 KB] (1234)
27304 Luo Xiao-Rong (罗小蓉), Luo Yin-Chun (罗尹春), Fan Ye (范叶), Hu Gang-Yi (胡刚毅), Wang Xiao-Wei (王骁玮), Zhang Zheng-Yuan (张正元), Fan Yuan-Hang (范远航), Cai Jin-Yong (蔡金勇), Wang Pei (王沛), Zhou Kun (周坤)
  A low specific on-resistance SOI MOSFET with dual gates and recessed drain
    Chin. Phys. B   2013 Vol.22 (2): 27304-027304 [Abstract] (873) [HTML 1 KB] [PDF 684 KB] (737)
118501 Zhao Kai (赵凯), Christoph Jungemann, Liu Xiao-Yan (刘晓彦 )
  Deterministic method study of the impact of the Pauli Principle in double-gate MOSFETs
    Chin. Phys. B   2012 Vol.21 (11): 118501-118501 [Abstract] (1071) [HTML 1 KB] [PDF 274 KB] (473)
68503 Wang Ying(王颖), Lan Hao(兰昊), Cao Fei(曹菲), Liu Yun-Tao(刘云涛), and Shao Lei(邵雷)
  A novel power UMOSFET with a variable K dielectric layer
    Chin. Phys. B   2012 Vol.21 (6): 68503-068503 [Abstract] (1457) [HTML 1 KB] [PDF 552 KB] (797)
57305 Ma Fei(马飞), Liu Hong-Xia(刘红侠), Kuang Qian-Wei(匡潜玮), and Fan Ji-Bin(樊继斌)
  The influence and explanation of fringing-induced barrier lowering on sub-100 nm MOSFETs with high-k gate dielectrics
    Chin. Phys. B   2012 Vol.21 (5): 57305-057305 [Abstract] (1518) [HTML 1 KB] [PDF 245 KB] (1084)
48502 Ren Min(任敏), Li Ze-Hong(李泽宏), Deng Guang-Min(邓光敏), Zhang Ling-Xia(张灵霞), Zhang Meng(张蒙), Liu Xiao-Long(刘小龙), Xie Jia-Xiong(谢加雄), and Zhang Bo(张波)
  A novel superjunction MOSFET with improved ruggedness under unclamped inductive switching
    Chin. Phys. B   2012 Vol.21 (4): 48502-048502 [Abstract] (1521) [HTML 1 KB] [PDF 470 KB] (2610)
97304 Zhou Xing-Ye(周幸叶), Zhang Jian(张健), Zhou Zhi-Ze(周致赜), Zhang Li-Ning(张立宁), Ma Chen-Yue(马晨月), Wu Wen(吴文), Zhao Wei(赵巍), and Zhang Xing(张兴)
  An improvement to computational efficiency of the drain current model for double-gate MOSFET
    Chin. Phys. B   2011 Vol.20 (9): 97304-097304 [Abstract] (1477) [HTML 1 KB] [PDF 371 KB] (939)
114220 Chen Jian-Jun(陈建军), Chen Shu-Ming(陈书明), Liang Bin(梁斌), He Yi-Bai(何益百), Chi Ya-Qing(池雅庆), and Deng Ke-Feng(邓科峰)
  Suppressing the hot carrier injection degradation rate in total ionizing dose effect hardened nMOSFETs
    Chin. Phys. B   2011 Vol.20 (11): 114220-114220 [Abstract] (1240) [HTML 0 KB] [PDF 3380 KB] (714)
17301 Liu Hong-Xia(刘红侠), Li Jin(李劲),Li Bin(李斌), Cao Lei(曹磊),and Yuan Bo(袁博)
  Two-dimensional analytical models for asymmetric fully depleted double-gate strained silicon MOSFETs
    Chin. Phys. B   2011 Vol.20 (1): 17301-017301 [Abstract] (1586) [HTML 0 KB] [PDF 935 KB] (1320)
16102 He Jin(何进), Liu Feng(刘峰), Zhou Xing-Ye(周幸叶), Zhang Jian(张健), and Zhang Li-Ning(张立宁)
  A continuous analytic channel potential solution to doped symmetric double-gate MOSFETs from the accumulation to the strong-inversion region
    Chin. Phys. B   2011 Vol.20 (1): 16102-016102 [Abstract] (1646) [HTML 1 KB] [PDF 589 KB] (1350)
97306 Cao Yan-Rong(曹艳荣), Ma Xiao-Hua(马晓华), Hao Yue(郝跃), and Tian Wen-Chao(田文超)
  The study on mechanism and model of negative bias temperature instability degradation in P-channel metal–oxide–semiconductor field-effect transistors
    Chin. Phys. B   2010 Vol.19 (9): 97306-097306 [Abstract] (1592) [HTML 1 KB] [PDF 785 KB] (747)
67304 Zhang Jian(张健), He Jin(何进), and Zhang Li-Ning(张立宁)
  One-dimensional continuous analytic potential solution to generic oxide-silicon-oxide system
    Chin. Phys. B   2010 Vol.19 (6): 67304-067304 [Abstract] (1645) [HTML 1 KB] [PDF 367 KB] (669)
57304 Du Gang(杜刚), Liu Xiao-Yan(刘晓彦), Xia Zhi-Liang(夏志良), Yang Jing-Feng(杨竞峰), and Han Ru-Qi(韩汝琦)
  Effect of interface roughness on the carrier transport in germanium MOSFETs investigated by Monte Carlo method
    Chin. Phys. B   2010 Vol.19 (5): 57304-057304 [Abstract] (1469) [HTML 1 KB] [PDF 289 KB] (655)
47306 Zhang Li-Ning(张立宁), He Jin(何进), Zhou Wang(周旺), Chen Lin(陈林), and Xu Yi-Wen(徐艺文)
  An oxide/silicon core/shell nanowire metal-oxide semiconductor field-effect transistor
    Chin. Phys. B   2010 Vol.19 (4): 47306-47306 [Abstract] (1488) [HTML 0 KB] [PDF 687 KB] (1012)
47204 Tang Xiao-Yan(汤晓燕), Zhang Yu-Ming(张玉明), and Zhang Yi-Men(张义门)
  Study of a 4H-SiC epitaxial n-channel MOSFET
    Chin. Phys. B   2010 Vol.19 (4): 47204-047204 [Abstract] (1414) [HTML 1 KB] [PDF 115 KB] (753)
37201 Ma Zhong-Fa(马中发), Zhang Peng(张鹏), Wu Yong(吴勇), Li Wei-Hua(李伟华), Zhuang Yi-Qi(庄奕琪), and Du Lei(杜磊)
  Accurate extraction of trap depth responsible for RTS noise in nano-MOSFETs
    Chin. Phys. B   2010 Vol.19 (3): 37201-037201 [Abstract] (1748) [HTML 1 KB] [PDF 345 KB] (954)
117309 Qin Shan-Shan(秦珊珊), Zhang He-Ming(张鹤鸣), Hu Hui-Yong(胡辉勇), Dai Xian-Ying(戴显英), Xuan Rong-Xi(宣荣喜), and Shu Bin(舒斌)
  An analytical threshold voltage model for dual-strained channel PMOSFET
    Chin. Phys. B   2010 Vol.19 (11): 117309-117309 [Abstract] (1204) [HTML 0 KB] [PDF 694 KB] (882)
107302 Li Jin(李劲), Liu Hong-Xia(刘红侠), Li Bin(李斌), Cao Lei(曹磊), and Yuan Bo(袁博)
  Study on two-dimensional analytical models for symmetrical gate stack dual gate strained silicon MOSFETs
    Chin. Phys. B   2010 Vol.19 (10): 107302-107302 [Abstract] (1390) [HTML 1 KB] [PDF 754 KB] (1039)
107301 Li Jin(李劲),Liu Hong-Xia(刘红侠),Li Bin(李斌),Cao Lei(曹磊), and Yuan Bo(袁博)
  The study on two-dimensional analytical model for gate stack fully depleted strained Si on silicon-germanium-on-insulator MOSFETs
    Chin. Phys. B   2010 Vol.19 (10): 107301-107301 [Abstract] (1365) [HTML 1 KB] [PDF 873 KB] (704)
1231 Wang Cai-Lin(王彩琳) and Sun Jun(孙军)
  An oxide filled extended trench gate super junction MOSFET structure
    Chin. Phys. B   2009 Vol.18 (3): 1231-1236 [Abstract] (1301) [HTML 1 KB] [PDF 788 KB] (2069)
685 Hou Xiao-Yu(侯晓宇), Huang Ru(黄如), Chen Gang(陈刚), Liu Sheng(刘晟), Zhang Xing(张兴), Yu Bin(俞滨), and Wang Yang-Yuan(王阳元)
  A novel 10-nm physical gate length double-gate junction field effect transistor
    Chin. Phys. B   2008 Vol.17 (2): 685-689 [Abstract] (1492) [HTML 1 KB] [PDF 1132 KB] (566)
4312 Li Zun-Chao (李尊朝)
  Performance and analytical modelling of halo-doped surrounding gate MOSFETs
    Chin. Phys. B   2008 Vol.17 (11): 4312-4317 [Abstract] (1368) [HTML 1 KB] [PDF 1287 KB] (633)
2111 Liu Hong-Xia (刘红侠) and Hao Yue (郝跃)
  Actions of negative bias temperature instability (NBTI) and hot carriers in ultra-deep submicron p-channel metal--oxide--semiconductor field-effect transistors (PMOSFETs)
    Chin. Phys. B   2007 Vol.16 (7): 2111-2115 [Abstract] (1555) [HTML 1 KB] [PDF 462 KB] (879)
1757 Ji Feng (季峰), Xu Jing-Ping(徐静平), and Lai Pui-To (黎沛涛)
  A threshold voltage model for high-k gate-dielectric MOSFETs considering fringing-field effect
    Chin. Phys. B   2007 Vol.16 (6): 1757-1763 [Abstract] (1347) [HTML 1 KB] [PDF 509 KB] (592)
1743 Tian Yu(田豫), Huang Ru(黄如), Zhang Xing(张兴), and Wang Yang-Yuan(王阳元)
  Tradeoff between speed and static power dissipation of ultra-thin body SOI MOSFETs
    Chin. Phys. B   2007 Vol.16 (6): 1743-1747 [Abstract] (1512) [HTML 0 KB] [PDF 509 KB] (573)
1445 Liu Hong-Xia(刘红侠), Li Zhong-He(李忠贺), and Hao Yue(郝跃)
  Degradation characteristics and mechanism of PMOSFETs under NBT--PBT--NBT stress
    Chin. Phys. B   2007 Vol.16 (5): 1445-1449 [Abstract] (1444) [HTML 1 KB] [PDF 458 KB] (833)
3820 Zhang Xue-Feng(张雪锋), Xu Jing-Ping (徐静平), Lai Pui-To(黎沛涛), Li Chun-Xia(李春霞), and Guan Jian-Guo(官建国)
  Effect of interface-roughness scattering on mobility degradation in SiGe p-MOSFETs with a high-k dielectric/SiO2 gate stack
    Chin. Phys. B   2007 Vol.16 (12): 3820-3826 [Abstract] (1351) [HTML 1 KB] [PDF 785 KB] (670)
240 Li Ding-Yu(李定宇), Sun Lei(孙雷), Zhang Sheng-Dong (张盛东), Wang Yi(王漪), Liu Xiao-Yan(刘晓彦), and Han Ru-Qi(韩汝琦)
  Schottky barrier MOSFET structure with silicide source/drain on buried metal
    Chin. Phys. B   2007 Vol.16 (1): 240-244 [Abstract] (1876) [HTML 1 KB] [PDF 387 KB] (625)
1339 Jiang Tao (姜涛), Zhang He-Ming (张鹤鸣), Wang Wei (王伟), Hu Hui-Yong (胡辉勇), Dai Xian-Ying (戴显英)
  Novel vertical stack HCMOSFET with strained SiGe/Si quantum channel
    Chin. Phys. B   2006 Vol.15 (6): 1339-1345 [Abstract] (1806) [HTML 0 KB] [PDF 294 KB] (654)
631 Zhang Xiao-Ju (张晓菊), Gong Xin (龚欣), Wang Jun-Ping (王俊平), Hao Yue (郝跃)
  Analytical analysis of surface potential for grooved-gate MOSFET
    Chin. Phys. B   2006 Vol.15 (3): 631-635 [Abstract] (1504) [HTML 0 KB] [PDF 505 KB] (634)
2742 Ma Xiao-Hua(马晓华), Hao Yue(郝跃), Wang Jian-Ping(王剑屏), Cao Yan-Rong(曹艳荣), and Chen Hai-Feng(陈海峰)
  New aspects of HCI test for ultra-short channel n-MOSFET devices
    Chin. Phys. B   2006 Vol.15 (11): 2742-2745 [Abstract] (1309) [HTML 0 KB] [PDF 181 KB] (727)
195 Ma Xiao-Hua (马晓华), Hao Yue (郝跃), Sun Bao-Gang (孙宝刚), Gao Hai-Xia (高海霞), Ren Hong-Xia (任红霞), Zhang Jin-Cheng (张进城), Zhang Jin-Feng (张金凤), Zhang Xiao-Ju (张晓菊), Zhang Wei-Dong (张卫东)
  Fabrication and characterization of groove-gate MOSFETs based on a self-aligned CMOS process
    Chin. Phys. B   2006 Vol.15 (1): 195-198 [Abstract] (1350) [HTML 1 KB] [PDF 270 KB] (939)
1644 Liu Hong-Xia (刘红侠), Hao Yue (郝跃), Hawkins I. D., Peaker A. R.
  Hot-carrier degradation characteristics and explanation in 0.25μm PMOSFETs
    Chin. Phys. B   2005 Vol.14 (8): 1644-1648 [Abstract] (1258) [HTML 1 KB] [PDF 252 KB] (489)
808 Ma Zhong-Fa (马仲发), Zhuang Yi-Qi (庄奕琪), Du Lei (杜磊), Wei Shan (魏珊)
  A percolation study of RTS noise in deep sub-micron MOSFET by Monte Carlo simulation
    Chin. Phys. B   2005 Vol.14 (4): 808-811 [Abstract] (1125) [HTML 1 KB] [PDF 215 KB] (578)
583 Tang Xiao-Yan (汤晓燕), Zhang Yi-Men (张义门), Zhang Yu-Ming (张玉明), Gao Jin-Xia (郜锦侠)
  6H-SiC Schottky barrier source/drain NMOSFET with field-induced source/drain extension
    Chin. Phys. B   2005 Vol.14 (3): 583-585 [Abstract] (1120) [HTML 0 KB] [PDF 223 KB] (672)
565 Zheng Zhong-Shan (郑中山), Liu Zhong-Li (刘忠立), Zhang Guo-Qiang (张国强), Li Ning (李宁), Fan Kai (范楷), Zhang En-Xia (张恩霞), Yi Wan-Bing (易万兵), Chen Meng (陈猛), Wang Xi (王曦)
  Effect of the technology of implanting nitrogen into buried oxide on the radiation hardness of the top gate oxide for partially depleted SOI PMOSFET
    Chin. Phys. B   2005 Vol.14 (3): 565-570 [Abstract] (1244) [HTML 1 KB] [PDF 279 KB] (964)
1110 Tang Xiao-Yan (汤晓燕), Zhang Yi-Men (张义门), Zhang Yu-Ming (张玉明), Gao Jin-Xia (郜锦侠)
  Analysis of the effect of sidewall on the performance of 6H-SiC Schottky barrier source/drain NMOSFETs
    Chin. Phys. B   2004 Vol.13 (7): 1110-1113 [Abstract] (1131) [HTML 0 KB] [PDF 190 KB] (408)
1104 Yu Chun-Li (于春利), Yang Lin-An (杨林安), Hao Yue (郝跃)
  A compact I-V model for lightly-doped-drain MOSFETs
    Chin. Phys. B   2004 Vol.13 (7): 1104-1109 [Abstract] (1045) [HTML 1 KB] [PDF 264 KB] (409)
1815 Tong Jian-Nong (童建农), Zou Xue-Cheng (邹雪城), Shen Xu-Bang (沈绪榜)
  Influence of structural parameters on the immunity of short-channel effects in grooved-gate nMOSFET
    Chin. Phys. B   2004 Vol.13 (11): 1815-1819 [Abstract] (1127) [HTML 1 KB] [PDF 212 KB] (409)
189 Ren Hong-xia (任红霞), Hao Yue (郝跃)
  HOT-CARRIER GENERATION MECHANISM AND HOT-CARRIER EFFECT IMMUNITY IN DEEP-SUB-MICRON GROOVED-GATE PMOSFETS
    Chin. Phys. B   2001 Vol.10 (3): 189-193 [Abstract] (1107) [HTML 0 KB] [PDF 257 KB] (548)
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