PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Effect of pressure and space between electrodes on the deposition of SiNxHy films in a capacitively coupled plasma reactor |
Meryem Grari1,?, CifAllah Zoheir1, Yasser Yousfi2, and Abdelhak Benbrik2 |
1 University Mohamed First, Department of Physics, LETSER Laboratory, Oujda, Morocco; 2 University Mohamed First, Department of Mathematics, LANO Laboratory, Oujda, Morocco |
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Abstract The fluid model, also called the macroscopic model, is commonly used to simulate low temperature and low pressure radiofrequency plasma discharges. By varying the parameters of the model, numerical simulation allows us to study several cases, providing us the physico-chemical information that is often difficult to obtain experimentally. In this work, using the fluid model, we employ numerical simulation to show the effect of pressure and space between the reactor electrodes on the fundamental properties of silicon plasma diluted with ammonia and hydrogen. The results show the evolution of the fundamental characteristics of the plasma discharge as a function of the variation of the pressure and the distance between the electrodes. By examining the pressure-distance product in a range between 0.3 Torr 2.7 cm and 0.7 Torr 4 cm, we have determined the optimal pressure-distance product that allows better deposition of hydrogenated silicon nitride (SiNxHy) films which is 0.7 Torr 2.7 cm.
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Received: 01 October 2020
Revised: 18 November 2020
Accepted manuscript online: 11 December 2020
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PACS:
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52.65.-y
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(Plasma simulation)
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52.77.-j
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(Plasma applications)
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52.65.Ww
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(Hybrid methods)
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52.30.-q
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(Plasma dynamics and flow)
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Corresponding Authors:
Meryem Grari
E-mail: grarimery@gmail.com
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Cite this article:
Meryem Grari, CifAllah Zoheir, Yasser Yousfi, and Abdelhak Benbrik Effect of pressure and space between electrodes on the deposition of SiNxHy films in a capacitively coupled plasma reactor 2021 Chin. Phys. B 30 055205
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[1] Grari M and Zoheir C 2020 Int. J. Eng. 33 1449 [2] Grari M and Zoheir C 2021 Proceedings of the 2nd International Conference on Electronic Engineering and Renewable Energy, ICEERE 2020, Springer, Singapore, p. 230 [3] Kim H J, Yang W and Joo J 2015 J. Appl. Phys. 118 043304 [4] Kim H J and Lee H J 2016 Plasma Sources Sci. Technol. 25 035006 [5] Bonilla R S, Reichel C, Hermle M and Wilshaw P R 2014 J. Appl. Phys. 115 144105 [6] Gritsenko V A 2009 Physics-Uspekhi 52 869 [7] Ferre R, Martín I, Ortega P, Vetter M, Torres I and Alcubilla R 2006 J. Appl. Phys. 100 073703 [8] Van Laar J H, Bissett H, Barry J C, Van der Walt I J and Crouse P L 2018 J. Eur. Ceram. Soc. 38 1197 [9] Qian M Y, Yang C Y, Chen X C, Ni G S, Liu S and Wang D Z 2015 Chin. Phys. Lett. 32 075202 [10] Yu M H 2019 Acta. Phys. Sin. 68 185202 (in Chinese) [11] Liu C Y, Wu B, Qian J P, Li G Q, Hou Y W, Wei W, Chen M X, Lei M Z and Guo Y 2020 Chin. Phys. B 29 025202 [12] Kim H J and Lee H J 2017 Plasma Sources Sci. Technol. 26 085003 [13] Kim H C, Iza F, Yang S S, Radmilović-Radjenović M and Lee J K 2005 J. Phys. D: Appl. Phys. 38 R283 [14] Bavafa M, Ilati H and Rashidian B 2008 Semicond. Sci. Tech. 23 095023 [15] Lymberopoulos D P and Economou D J 1995 J. Res. Natl. Inst. Stan. 100 473 [16] Hao D X, Chen J, Ji L H and Sun Y C 2012 J. Semicond. 33 104004 [17] Rebiai S, Bahouh H and Sahli S 2013 IEEE Trans. Dielectr. Electr. Insul. 20 1616 [18] Grari M and Zoheir C 2019 Materials Today: Proceedings. 13 888 [19] Boeuf J P and Pitchford L C 1995 Phys. Rev. E 51 1376 [20] Hayashi database 2016 www.lxcat.net, retrieved on October 27, 2016 [21] Kim H J and Lee H J 2017 Plasma Sources Sci. Technol. 26 085003 [22] Lieberman M A and Lichtenberg A J 2005 Principles of plasma discharges and materials processing (John Wiley & Sons) p. 387 [23] Samir T, Liu Y, Zhao L L and Zhou Y W 2017 Chin. Phys. B 26 115201 |
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