| INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
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Optimize Purcell filter design for reducing influence of fabrication variation |
| Xiao Cai(蔡晓)1, Yi-Biao Zhou(周翼彪)2, Wen-Long Yu(于文龙)1, Kang-Lin Xiong(熊康林)1,2, and Jia-Gui Feng(冯加贵)1,2,† |
1 Gusu Laboratory of Materials, Suzhou 215123, China;
2 Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China |
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Abstract To protect superconducting qubits and enable rapid readout, optimally designed Purcell filters are essential. To suppress the off-resonant driving of untargeted readout resonators, individual Purcell filters are used for each readout resonator. However, achieving consistent frequency between a readout resonator and a Purcell filter is a significant challenge. A systematic computational analysis is conducted to investigate how fabrication variation affects filter performance, through focusing on the coupling capacitor structure and coplanar waveguide (CPW) transmission line specifications. The results indicate that the T-type enclosing capacitor (EC), which exhibits lower structural sensitivity, is more advantageous for achieving target capacitance than the C-type EC and the interdigital capacitor (IDC). By utilizing a large-sized CPW with the T-type EC structure, fluctuations in the effective coupling strength can be reduced to 10%, given typical micro-nanofabrication variances. The numerical simulations presented in this work minimize the influence of fabrication deviations, thereby significantly improving the reliability of Purcell filter designs.
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Received: 25 December 2023
Revised: 25 February 2024
Accepted manuscript online: 13 March 2024
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PACS:
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85.25.Am
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(Superconducting device characterization, design, and modeling)
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84.30.Vn
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(Filters)
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84.32.Tt
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(Capacitors)
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03.67.Lx
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(Quantum computation architectures and implementations)
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| Fund: Project support by the Youth Innovation Promotion Association of the Chinese Academy of Sciences (CAS) (Grant No. 2019319), the Start-up Foundation of Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, Suzhou, China (Grant No. Y9AAD110), the Innovative and Entrepreneurial Talents Project of Jiangsu Province, China (Grant No. JSSCBS20221743), and the Excellent Postdoctoral Talent Program of Jiangsu Province, China (Grant No. 2023ZB816). |
Corresponding Authors:
Jia-Gui Feng
E-mail: jgfeng2017@sinano.ac.cn
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Cite this article:
Xiao Cai(蔡晓), Yi-Biao Zhou(周翼彪), Wen-Long Yu(于文龙), Kang-Lin Xiong(熊康林), and Jia-Gui Feng(冯加贵) Optimize Purcell filter design for reducing influence of fabrication variation 2024 Chin. Phys. B 33 068501
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