Growth of high-crystallinity uniform GaAs nanowire arrays by molecular beam epitaxy
Yu-Bin Kang(亢玉彬)1, Feng-Yuan Lin(林逢源)1,†, Ke-Xue Li(李科学)1, Ji-Long Tang(唐吉龙)1,‡, Xiao-Bing Hou(侯效兵)1, Deng-Kui Wang(王登魁)1, Xuan Fang(方铉)1, Dan Fang(房丹)1, Xin-Wei Wang(王新伟)2, and Zhi-Peng Wei(魏志鹏)1
1 State Key Laboratory of High Power Semiconductor Lasers, Changchun University of Science and Technology, Changchun 130022, China; 2 School of Materials Science and Engineering, Changchun University of Science and Technology, Changchun 130022, China
Abstract The self-catalyzed growth of GaAs nanowires (NWs) on silicon (Si) is an effective way to achieve integration between group Ⅲ-V elements and Si. High-crystallinity uniform GaAs NW arrays were grown by solid-source molecular beam epitaxy (MBE). In this paper, we describe systematic experiments which indicate that the substrate treatment is crucial to the highly crystalline and uniform growth of one-dimensional nanomaterials. The influence of natural oxidation time on the crystallinity and uniformity of GaAs NW arrays was investigated and is discussed in detail. The GaAs NW crystallinity and uniformity are maximized after 20 days of natural oxidation time. This work provides a new solution for producing high-crystallinity uniform Ⅲ-V nanowire arrays on wafer-scale Si substrates. The highly crystalline uniform NW arrays are expected to be useful for NW-based optical interconnects and Si platform optoelectronic devices.
(Molecular, atomic, ion, and chemical beam epitaxy)
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 61674021, 11674038, 61704011, 61904017, 11804335, and 12074045), the Developing Project of Science and Technology of Jilin Province, China (Grant No. 20200301052RQ), the Project of Education Department of Jilin Province, China (Grant No. JJKH20200763KJ), and the Youth Foundation of Changchun University of Science and Technology (Grant No. XQNJJ-2018-18).
Yu-Bin Kang(亢玉彬), Feng-Yuan Lin(林逢源), Ke-Xue Li(李科学), Ji-Long Tang(唐吉龙), Xiao-Bing Hou(侯效兵), Deng-Kui Wang(王登魁), Xuan Fang(方铉), Dan Fang(房丹), Xin-Wei Wang(王新伟), and Zhi-Peng Wei(魏志鹏) Growth of high-crystallinity uniform GaAs nanowire arrays by molecular beam epitaxy 2021 Chin. Phys. B 30 078102
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Strain compensated type II superlattices grown by molecular beam epitaxy Chao Ning(宁超), Tian Yu(于天), Rui-Xuan Sun(孙瑞轩), Shu-Man Liu(刘舒曼), Xiao-Ling Ye(叶小玲), Ning Zhuo(卓宁), Li-Jun Wang(王利军), Jun-Qi Liu(刘俊岐), Jin-Chuan Zhang(张锦川), Shen-Qiang Zhai(翟慎强), and Feng-Qi Liu(刘峰奇). Chin. Phys. B, 2023, 32(4): 046802.
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