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Chin. Phys. B, 2021, Vol. 30(2): 028501    DOI: 10.1088/1674-1056/abb7fc
INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY Prev   Next  

Snapback-free shorted anode LIGBT with controlled anode barrier and resistance

Shun Li(李顺)1, Jin-Sha Zhang(张金沙)1, Wei-Zhong Chen(陈伟中)1,2,†, Yao Huang(黄垚)1, Li-Jun He(贺利军)1, and Yi Huang(黄义)1
1 College of Electronics Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065, China; 2 Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
Abstract  A novel shorted anode lateral-insulated gate bipolar transistor (SA LIGBT) with snapback-free characteristic is proposed and investigated. The device features a controlled barrier V barrier and resistance R SA in anode, named CBR LIGBT. The electron barrier is formed by the P-float/N-buffer junction, while the anode resistance includes the polysilicon layer and N-float. At forward conduction stage, the V barrier and R SA can be increased by adjusting the doping of the P-float and polysilicon layer, respectively, which can suppress the unipolar mode to eliminate the snapback. At turn-off stage, the low-resistance extraction path (N-buffer/P-float/polysilicon layer /N-float) can quickly extract the electrons in the N-drift, which can effectively accelerate the turn-off speed of the device. The simulation results show that at the same V on of 1.3 V, the E off of the CBR LIGBT is reduced by 85%, 73%, and 59.6% compared with the SSA LIGBT, conventional LIGBT, and TSA LIGBT, respectively. Additionally, at the same E off of 1.5 mJ/cm2, the CBR LIGBT achieves the lowest V on of 1.1 V compared with the other LIGBTs.
Keywords:  shorted anode lateral-insulated gate bipolar transistor      snapback      barrier      trade-off  
Received:  22 July 2020      Revised:  01 September 2020      Accepted manuscript online:  14 September 2020
PACS:  85.30.De (Semiconductor-device characterization, design, and modeling)  
  85.30.Pq (Bipolar transistors)  
  85.30.Tv (Field effect devices)  
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 61604027 and 61704016) and the Fund from Chongqing Technology Innovation and Application Development (Key Industry Research and Development), China (Grant No. cstc2018jszx-cyzd0646).
Corresponding Authors:  Corresponding author. E-mail: cwz@cqu.edu.cn   

Cite this article: 

Shun Li(李顺), Jin-Sha Zhang(张金沙), Wei-Zhong Chen(陈伟中), Yao Huang(黄垚), Li-Jun He(贺利军), and Yi Huang(黄义) Snapback-free shorted anode LIGBT with controlled anode barrier and resistance 2021 Chin. Phys. B 30 028501

1 Iwamuro N and Laska T 2017 IEEE Trans. Electron Dev. 64 741
2 Jiang H P, Zhang B, Chen W J, Li Z J, Liu C, Rao Z G and Dong B 2012 IEEE Electron Dev. Lett. 33 417
3 Yi B, Jia L, Zhang B K, Chen J J and Xiong Y 2020 IEEE Trans. Electron Dev. 67 2058
4 Deng G Q, Luo X R, Zhou K, He Q Y, Ruan X L, Liu Q, Sun T and Zhang B 2017 Proc. ISPSD 127
5 Huang M M, Li J, Xie C J, Lai L and Gong M 2020 Electron. Lett. 56 153
6 Hu H, Kong M F, Yi B and Chen X B 2020 IEEE Trans. Electron Dev. 67 1059
7 Wu J Y, Huang H M, Yi B, Hu H, Hu H and Chen X B 2020 IEEE J. Electron Dev. Soc. 7 1013
8 Duan B X, Sun L C and Yang Y T 2019 IEEE Electron Dev. Lett. 40 63
9 Zhang B K, Kong M F, Yi B and Chen X B 2020 IEEE Trans. Electron Dev. 67 2020
10 Li J H, Tang Y, Zhang G J, Liu J, Liu K F, Hu B and Li W 2020 IEEE Electron Dev. Lett. 41 573
11 Zhang L, Zhu J, Sun W F, Chen M, Zhao M N, Huang X Q, Chen J J, Qian Y X and Shi L X 2017 IEEE Trans. Electron Dev. 64 1187
12 Chen W Z, Guo Q, He L J, Han Z S, Wang Y C and Li X Y 2017 IEICE Electronics Express 14 1
13 Pathirana V, Udugampola N, Trajkovic T and Udrea F. 2018 IEEE Electron Dev. Lett. 39 866
14 Chen W Z, Huang Y, He L J, Han Z S and Huang Y 2018 Chin. Phys. B 27 088501
15 Luo X R, Yang Y, Sun T, Wei J, Fan D, Ouyang D F, Deng G Q, Yang Y H, Zhang B and Li Z J 2019 IEEE Trans. Electron Dev. 66 1390
16 Tian T, Guo Y F, Yao J F, Zhang J, Wang K and Li M 2019 IEEE J. Electron Dev. Soc. 7 725
17 He Y T, Qiao M and Zhang B 2018 Chin. Phys. B 25 127304
18 Sin J K O and Mukherjee S 1991 IEEE Electron Dev. Lett. 12 45
19 Chul J H, Byeon D S, Oh J K, Han M K and Choi Y I 2000 Proc. ISPSD 149
20 Park J M, Wagner S, Grasser T and Selberherr S 2003 Solid-State Electronics 48 1007
21 Zhang L, Zhu J, Sun W F, Du Y C, Yu H, Huang K Q and Shi L X 2015 Proc. ISPSD 49
22 Zhu J, Zhang L, Sun W F, Chen M, Zhou F, Zhao M N, Shi L X, Gu Y and Zhang S 2016 IEEE Trans. Electron Dev. 63 2003
23 Chen W Z, Li S, Huang Y, Huang Y and Han Z S 2020 IEEE J. Electron Dev. Soc. In Press
24 `Taurus Medici DAVINCI User's Guides', Synopsys, Mountain View, CA, USA, 2014
25 Zhou K, Sun T, Liu Q, Zhang B, Li Z J and Luo X R 2017 Proc. ISPSD 315
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