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Chin. Phys. B, 2017, Vol. 26(6): 067701    DOI: 10.1088/1674-1056/26/6/067701
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Prev   Next  

Influences of different oxidants on characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition

Ji-Bin Fan(樊继斌)1, Hong-Xia Liu(刘红侠)2, Li Duan(段理)1, Yan Zhang(张研)1, Xiao-Chen Yu(于晓晨)1
1 School of Materials Science and Engineering, Chang'an University, Xi'an 710061, China;
2 School of Microelectronics, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China
Abstract  

A comparative study of two kinds of oxidants (H2O and O3) with the combination of two metal precursors (TMA and La(iPrCp)3) for atomic layer deposition (ALD) La2O3/Al2O3 nanolaminates is carried out. The effects of different oxidants on the physical properties and electrical characteristics of La2O3/Al2O3 nanolaminates are studied. Initial testing results indicate that La2O3/Al2O3 nanolaminates could avoid moisture absorption in the air after thermal annealing. However, moisture absorption occurs in H2O-based La2O3/Al2O3 nanolaminates due to the residue hydroxyl/hydrogen groups during annealing. As a result, roughness enhancement, band offset variation, low dielectric constant and poor electrical characteristics are measured because the properties of H2O-based La2O3/Al2O3 nanolaminates are deteriorated. Addition thermal annealing effects on the properties of O3-based La2O3/Al2O3 nanolaminates indicate that O3 is a more appropriate oxidant to deposit La2O3/Al2O3 nanolaminates for electron devices application.

Keywords:  La2O3/Al2O3nanolaminates      atomic layer deposition      oxidants      annealing  
Received:  30 November 2016      Revised:  27 February 2017      Accepted manuscript online: 
PACS:  77.55.D-  
  82.80.Pv (Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.))  
Fund: 

Project supported by the National Natural Science Foundation of China (Grant Nos. 61604016 and 51501017) and the Fundamental Research Funds for the Central Universities, China (Grant No. 310831161003).

Corresponding Authors:  Ji-Bin Fan     E-mail:  jbfan@chd.edu.cn

Cite this article: 

Ji-Bin Fan(樊继斌), Hong-Xia Liu(刘红侠), Li Duan(段理), Yan Zhang(张研), Xiao-Chen Yu(于晓晨) Influences of different oxidants on characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition 2017 Chin. Phys. B 26 067701

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