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Understanding of surface pit formation mechanism of GaN grown in MOCVD based on local thermodynamic equilibrium assumption |
Zhi-Yuan Gao(高志远), Xiao-Wei Xue(薛晓玮), Jiang-Jiang Li(李江江), Xun Wang(王勋), Yan-Hui Xing(邢艳辉), Bi-Feng Cui(崔碧峰), De-Shu Zou(邹德恕) |
Microelectronic School, Beijing University of Technology, Beijing 100124, China |
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Abstract Frank's theory describes that a screw dislocation will produce a pit on the surface, and has been evidenced in many material systems including GaN. However, the size of the pit calculated from the theory deviates significantly from experimental result. Through a careful observation of the variations of surface pits and local surface morphology with growing temperature and V/III ratio for c-plane GaN, we believe that Frank's model is valid only in a small local surface area where thermodynamic equilibrium state can be assumed to stay the same. If the kinetic process is too vigorous or too slow to reach a balance, the local equilibrium range will be too small for the center and edge of the screw dislocation spiral to be kept in the same equilibrium state. When the curvature at the center of the dislocation core reaches the critical value 1/r0, at the edge of the spiral, the accelerating rate of the curvature may not fall to zero, so the pit cannot reach a stationary shape and will keep enlarging under the control of minimization of surface energy to result in a large-sized surface pit.
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Received: 25 October 2015
Revised: 22 January 2016
Accepted manuscript online:
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PACS:
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61.72.Cc
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(Kinetics of defect formation and annealing)
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68.55.-a
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(Thin film structure and morphology)
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81.15.Gh
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(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
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61.72.uj
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(III-V and II-VI semiconductors)
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Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11204009 and 61204011) and the Beijing Municipal Natural Science Foundation, China (Grant No. 4142005). |
Corresponding Authors:
Zhi-Yuan Gao
E-mail: zygao@bjut.edu.cn
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Cite this article:
Zhi-Yuan Gao(高志远), Xiao-Wei Xue(薛晓玮), Jiang-Jiang Li(李江江), Xun Wang(王勋), Yan-Hui Xing(邢艳辉), Bi-Feng Cui(崔碧峰), De-Shu Zou(邹德恕) Understanding of surface pit formation mechanism of GaN grown in MOCVD based on local thermodynamic equilibrium assumption 2016 Chin. Phys. B 25 066105
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