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Damage effect and mechanism of the GaAs high electron mobility transistor induced by high power microwave |
Yang Liu(刘阳)1, Chang-Chun Chai(柴常春)1, Yin-Tang Yang(杨银堂)1, Jing Sun(孙静)2, Zhi-Peng Li(李志鹏)2 |
1 Ministry of Education Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China; 2 Space Payload System Innovation Center, China Academy of Space Technology, Xi'an 710100, China |
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Abstract In this paper, we present the damage effect and mechanism of high power microwave (HPM) on AlGaAs/GaAs pseudomorphic high-electron-mobility transistor (pHEMT) of low-noise amplifier (LNA). A detailed investigation is carried out by simulation and experiment study. A two-dimensional electro-thermal model of the typical GaAs pHEMT induced by HPM is established in this paper. The simulation result reveals that avalanche breakdown, intrinsic excitation, and thermal breakdown all contribute to damage process. Heat accumulation occurs during the positive half cycle and the cylinder under the gate near the source side is most susceptible to burn-out. Experiment is carried out by injecting high power microwave into GaAs pHEMT LNA samples. It is found that the damage to LNA is because of the burn-out at first stage pHEMT. The interiors of the damaged samples are observed by scanning electron microscopy (SEM) and energy dispersive spectrometer (EDS). Experimental results accord well with the simulation of our model.
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Received: 02 December 2015
Revised: 26 December 2015
Accepted manuscript online:
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PACS:
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85.30.Tv
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(Field effect devices)
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84.40.-x
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(Radiowave and microwave (including millimeter wave) technology)
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Fund: Project supported by the National Basic Research Program of China (Grant No. 2014CB339900) and the Open Fund of Key Laboratory of Complex Electromagnetic Environment Science and Technology, China Academy of Engineering Physics (Grant No. 2015-0214.XY.K). |
Corresponding Authors:
Yang Liu
E-mail: yyliu1987@163.com
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Cite this article:
Yang Liu(刘阳), Chang-Chun Chai(柴常春), Yin-Tang Yang(杨银堂), Jing Sun(孙静), Zhi-Peng Li(李志鹏) Damage effect and mechanism of the GaAs high electron mobility transistor induced by high power microwave 2016 Chin. Phys. B 25 048504
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[1] |
Ren Z, Yin W Y Shi Y B and Liu Q H 2010 IEEE Trans. Electron Dev. 57 345
|
[2] |
Kim Kand Iliadis A A 2010 Solid-State Electron. 54 18
|
[3] |
Iliadis A Aand Kyechong K 2010 IEEE Trans. Dev. Mater. Reliab. 10 347
|
[4] |
Mansson D, Thottappillil R, Nilsson T, Lunden O and Backstrom M 2008 IEEE Trans. Electromagn. Compat. 50 434
|
[5] |
Kim K and Iliadis A A 2008 Solid-State Electron. 52 1589
|
[6] |
Nitsch D, Camp M, Sabath F, ter Haseborg J L and Garbe H 2004 IEEE Trans. Electromagn. Compat. 46 380
|
[7] |
Sabath F 2008 Poceedings of the 29th General Assembly of the URSI, 2008, Chicago, USA, p. 50 101
|
[8] |
Brauer F, Sabath F. terHaseborg J L 2009 IEEE International Symposium on the Electromagnetic Compatibility, 2009, Piscataway, NJ, USA
|
[9] |
Fang J Y, Shen J A, Yang Z Q and Qiao D J 2003 High Power Laser and Particle Beams 15 591 (in Chinese)
|
[10] |
Palisek L and Suchy L 2009 Proceeding of the 17th IEEE International Pulsed Power Conference, 2009, Washington, DC, USA, p. 1244
|
[11] |
Backstrom M G and Lovstrand K G 2004 IEEE Trans. Electromagn. Compat. 46 396
|
[12] |
Klunder C and Haseborg J L 2010 IEEE International Symposium on the Electromagnetic Compatibility, 2010, p. 359
|
[13] |
Liu C J, Yan L P, Fan R D, Luo J and Pu T L 2007 High Power Laser and Particle Beams 19 1580 (in Chinese)
|
[14] |
Yu X H, Chai C C, Ren X R, Yang Y T, Xi X W and Liu Y 2014 J. Semicond. 35 084011
|
[15] |
Ma Z Y, Chai C C, Ren X R, Yang Y T and Chen B 2012 Acta Phys. Sin. 61 078501 (in Chinese)
|
[16] |
Ma Z Y, Chai C C, Ren X R, Yang Y T Chen B and Zhao Y B 2012 Chin. Phys. B 21 058502
|
[17] |
Ma Z Y, Chai C C, Ren X R, Yang Y T, Chen B, Song K and Zhao Y B 2012 Chin. Phys. B 21 098502
|
[18] |
Ma Z Y, Chai C C, Ren X R, Yang Y T, Zhao Y B and Qiao L P 2013 Chin. Phys. B 22 028502
|
[19] |
Wemple S H, Niehous W C, Fukui H, Irvin J C, Cox H M, Hwang J C, Dilorenzo J V and Schlosser W O 1981 IEEE Trans. Electron Dev. 28 834
|
[20] |
Whalen J J, Kemerley R and Rastefano E 1982 IEEE Trans. Micro. Theory Tech. 30 2206
|
[21] |
Zhang C B, Wang H G, Zhang J D, Du G X and Yang J 2014 IEEE Trans. Electromagn. Compat. 56 1545
|
[22] |
Yu X H, Chai C C, Liu Y, Yang Y T and Fan Q Y 2015 Microelectron. Reliab. 55 1174
|
[23] |
Zhang C B, Zhang J D, Wang H G and Du G X 2015 Microelectron. Reliab. 55 508
|
[24] |
Adachi S Properties of Gallium Arsenide. EMIS Datareviews Series (Lodon: Rrozel and G.E.Stillman) p. 32
|
[25] |
Blakemore J S 1982 J. Appl. Phys. 53 123
|
[26] |
Canali C, Majni G, Minder R and Ottaviani G 1975 IEEE Trans. Elec-tron Dev. 22 1045
|
[27] |
Synopsys Inc. 2013 Sentaurus Device User Guide, CA, USA
|
[28] |
Liu E K, Zhu B S and Luo J S 1994 The Physics of Semiconductor (Beijing: National Defense Industry Press), p. 100 (in Chinese)
|
[29] |
Chai C C, Yang Y T, Zhang B, Leng P, Yang Y and Rao W 2009 Semi-cond. Sci. Technol. 24 035003
|
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