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A novel planar vertical double-diffused metal-oxide- semiconductor field-effect transistor with inhomogeneous floating islands |
Ren Min(任敏)†, Li Ze-Hong(李泽宏), Liu Xiao-Long(刘小龙), Xie Jia-Xiong(谢加雄), Deng Guang-Min(邓光敏), and Zhang Bo(张波) |
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
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Abstract A novel planar vertical double-diffused metal-oxide-semiconductor (VDMOS) structure with an ultra-low specific on-resistance (Ron,sp), whose distinctive feature is the use of inhomogeneous floating p-islands in the n-drift region, is proposed. The theoretical limit of its Ron,sp is deduced, the influence of structure parameters on the breakdown voltage (BV) and Ron,sp are investigated, and the optimized results with BV of 83 V and Ron,sp of 54 mOmega cdotmm2 are obtained. Simulations show that the inhomogeneous-floating-islands metal-oxide-semiconductor field-effect transistor (MOSFET) has a superior “Ron,sp/BV” trade-off to the conventional VDMOS (a 38% reduction of Ron,sp with the same BV) and the homogeneous-floating-islands MOSFET (a 10% reduction of Ron,sp with the same BV). The inhomogeneous-floating-islands MOSFET also has a much better body-diode characteristic than the superjunction MOSFET. Its reverse recovery peak current, reverse recovery time and reverse recovery charge are about 50, 80 and 40% of those of the superjunction MOSFET, respectively.
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Received: 23 June 2011
Revised: 10 July 2011
Accepted manuscript online:
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PACS:
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85.30.Tv
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(Field effect devices)
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85.30.De
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(Semiconductor-device characterization, design, and modeling)
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Fund: Project supported by the National Key Scientific and Technological Project (Grant No. 2011ZX02503-005) and the Fundamental Research Funds for the Central Universities (Grant No. ZYGX2010J038). |
Cite this article:
Ren Min(任敏), Li Ze-Hong(李泽宏), Liu Xiao-Long(刘小龙), Xie Jia-Xiong(谢加雄), Deng Guang-Min(邓光敏), and Zhang Bo(张波) A novel planar vertical double-diffused metal-oxide- semiconductor field-effect transistor with inhomogeneous floating islands 2011 Chin. Phys. B 20 128501
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