Study of nanocrystalline VO2 thin films prepared by magnetron sputtering and post-oxidation

doi:10.1088/1674-1056/19/10/106103

Abstract Nanocrystalline VO₂ thin films were deposited onto glass slides by direct current magnetron sputtering and post-oxidation. These films undergo semiconductor–metal transition at 70 $^\circ$C, accompanied by a resistance drop of two magnitude orders. The crystal structures and surface morphologies of the VO₂ films were characterized by x-ray diffraction (XRD) and atomic force microscope (AFM), respectively. Results reveal that the average grain size of VO₂ nanograins measured by XRD is smaller than those measured by AFM. In addition, Raman characterization indicates that stoichiometric VO₂ and oxygen-rich VO₂ phases coexist in the films, which is supported by x-ray photoelectron spectroscopy (XPS) results. Finally, the optical properties of the VO₂ films in UV-visible range were also evaluated. The optical band gap corresponding to 2p–3d inter-band transition was deduced according to the transmission and reflection spectra. And the deduced value, E_opt2p–3d=1.81 eV, is in good agreement with that previously obtained by theoretical calculation.

Keywords: nanocrystal vanadium dioxide magnetron sputtering post-oxidation

Received: 09 December 2009
Revised: 12 April 2010
Accepted manuscript online:

PACS:	61.46.Hk	(Nanocrystals)
	68.55.-a	(Thin film structure and morphology)
	78.30.Hv	(Other nonmetallic inorganics)
	78.66.Li	(Other semiconductors)
	81.15.Cd	(Deposition by sputtering)
	81.16.Pr	(Micro- and nano-oxidation)

Fund: Project partly supported by the National Natural Science Foundation of China (Grant No. 60736005).

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Luo Zhen-Fei(罗振飞), Wu Zhi-Ming(吴志明), Xu Xiang-Dong(许向东), Wang Tao(王涛), and Jiang Ya-Dong(蒋亚东) Study of nanocrystalline VO₂ thin films prepared by magnetron sputtering and post-oxidation 2010 Chin. Phys. B 19 106103

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Study of nanocrystalline VO2 thin films prepared by magnetron sputtering and post-oxidation

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Study of nanocrystalline VO₂ thin films prepared by magnetron sputtering and post-oxidation