Atomically self-healing of structural defects in monolayer WSe2

doi:10.1088/1674-1056/ad641f

Abstract Minimizing disorder and defects is crucial for realizing the full potential of two-dimensional transition metal dichalcogenides (TMDs) materials and improving device performance to desired properties. However, the methods in defect control currently face challenges with overly large operational areas and a lack of precision in targeting specific defects. Therefore, we propose a new method for the precise and universal defect healing of TMD materials, integrating real-time imaging with scanning transmission electron microscopy (STEM). This method employs electron beam irradiation to stimulate the diffusion migration of surface-adsorbed adatoms on TMD materials grown by low-temperature molecular beam epitaxy (MBE), and heal defects within the diffusion range. This approach covers defect repairs ranging from zero-dimensional vacancy defects to two-dimensional grain orientation alignment, demonstrating its universality in terms of the types of samples and defects. These findings offer insights into the use of atomic-level focused electron beams at appropriate voltages in STEM for defect healing, providing valuable experience for achieving atomic-level precise fabrication of TMD materials.

Keywords: scanning transmission electron microscopy (STEM) atom manipulation nanoscale materials and structures: fabrication and characterization new materials: theory design fabrication

Received: 01 May 2024
Revised: 12 July 2024
Accepted manuscript online: 17 July 2024

PACS:	68.37.Ma	(Scanning transmission electron microscopy (STEM))
	81.16.Ta	(Atom manipulation)
	81.07.-b	(Nanoscale materials and structures: fabrication and characterization)
	81.05.Zx	(New materials: theory, design, and fabrication)

Fund: X.Z. thanks the Beijing Natural Science Foundation (Grant Nos. JQ24010 and Z220020), the Fundamental Research Funds for the Central Universities, and the National Natural Science Foundation of China (Grant No. 52273279). Project supported by the Electron Microscopy Laboratory of Peking University, China for the use of Nion U-HERMES200 scanning transmission electron microscopy.

Corresponding Authors: Xiaoxu Zhao
E-mail: xiaoxuzhao@pku.edu.cn

Cite this article:

Kangshu Li(李康舒), Junxian Li(李俊贤), Xiaocang Han(韩小藏), Wu Zhou(周武), and Xiaoxu Zhao(赵晓续) Atomically self-healing of structural defects in monolayer WSe₂ 2024 Chin. Phys. B 33 096804

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Atomically self-healing of structural defects in monolayer WSe2

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Atomically self-healing of structural defects in monolayer WSe₂