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X-band inverse class-F GaN internally-matched power amplifier |
Bo-Chao Zhao(赵博超)1, Yang Lu(卢阳)1, Wen-Zhe Han(韩文哲)1, Jia-Xin Zheng(郑佳欣)2, Heng-Shuang Zhang(张恒爽)1, Pei-jun Ma(马佩军)1, Xiao-Hua Ma(马晓华)2, Yue Hao(郝跃)1,2 |
1. School of Microelectronics, Xidian University, Xi'an 710071, China;
2. School of Advanced Material and Nanotechnology, Xidian University, Xi'an 710071, China |
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Abstract An X-band inverse class-F power amplifier is realized by a 1-mm AlGaN/GaN high electron mobility transistor (HEMT). The intrinsic and parasitic components inside the transistor, especially output capacitor Cds, influence the harmonic impedance heavily at the X-band, so compensation design is used for meeting the harmonic condition of inverse class-F on the current source plane. Experiment results show that, in the continuous-wave mode, the power amplifier achieves 61.7% power added efficiency (PAE), which is 16.3% higher than the class-AB power amplifier realized by the same kind of HEMT. To the best of our knowledge, this is the first inverse class-F GaN internally-matched power amplifier, and the PAE is quite high at the X-band.
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Received: 06 February 2016
Revised: 27 May 2016
Accepted manuscript online:
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PACS:
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73.61.Ey
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(III-V semiconductors)
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84.60.Bk
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(Performance characteristics of energy conversion systems; figure of merit)
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84.30.Le
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(Amplifiers)
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84.40.-x
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(Radiowave and microwave (including millimeter wave) technology)
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Fund: Project supported by the National High Technology Research and Development Program of China (Grant No. 2015AA016801). |
Corresponding Authors:
Pei-jun Ma
E-mail: pjma@xidian.edu.cn
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Cite this article:
Bo-Chao Zhao(赵博超), Yang Lu(卢阳), Wen-Zhe Han(韩文哲), Jia-Xin Zheng(郑佳欣), Heng-Shuang Zhang(张恒爽), Pei-jun Ma(马佩军), Xiao-Hua Ma(马晓华), Yue Hao(郝跃) X-band inverse class-F GaN internally-matched power amplifier 2016 Chin. Phys. B 25 097306
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