Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films

doi:10.1088/1674-1056/19/8/086802

Abstract The grain size and surface morphology of sputtered Au films are studied by x-ray diffraction and atomic force microscope. For as-deposited samples the grain growth mechanism is consistent with the two-dimensional (2D) theory, which gives relatively low diffusion coefficient during deposition. The annealing process demonstrates the secondary grain growth mechanism in which the thickness dependence of grain boundary energy plays a key role. The surface roughness increases with the increase of grain size.

Keywords: grain size surface morphology Au film magnetron sputtering

Received: 17 May 2010
Revised: 01 June 2010
Accepted manuscript online:

PACS:	68.35.B-	(Structure of clean surfaces (and surface reconstruction))
	61.72.Mm	(Grain and twin boundaries)
	66.30.Fq	(Self-diffusion in metals, semimetals, and alloys)
	68.55.-a	(Thin film structure and morphology)
	81.15.Cd	(Deposition by sputtering)
	81.30.-t	(Phase diagrams and microstructures developed by solidification and solid-solid phase transformations)

Fund: Project supported by the National Basic Research Program of China (Grant No. 2006CB91304), and the Knowledge Innovation Program of the Chinese Academy of Sciences.

Cite this article:

Zhang Xin(张鑫), Song Xiao-Hui(宋小会), and Zhang Dian-Lin(张殿琳) Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films 2010 Chin. Phys. B 19 086802

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Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films

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