Effect of hydrogen plasma implantation on the micro-structure and magnetic properties of hcp-Co8057Fe4Ir16 thin films
Hui Wang(王辉)1, Meng Wu(吴猛)2, Haiping Zhou(周海平)3, Bo Zhang(张博)1, Shixin Hu(胡世欣)1, Tianyong Ma(马天勇)4, Zhiwei Li(李志伟)1,†, Liang Qiao(乔亮)1, Tao Wang(王涛)1,‡, and Fashen Li(李发伸)1
1 Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Key Laboratory for Special Functional Materials and Structure Design of the Ministry of Education, Lanzhou University, Lanzhou 730000, China; 2 Department of Physics, Xiamen University, Xiamen 361005, China; 3 School of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 611731, China; 4 School of Electrical and Information Engineering, North Minzu University, Yinchuan 750021, China
Abstract We present detailed investigations of structural and static/dynamic magnetic properties of hydrogenated hcp-Co8057Fe4Ir16 soft magnetic thin films. Two different kinds of defects, i.e., destructive and non-destructive, were demonstrated by controlling the negative bias voltage of the hydrogenation process. Our results show that the structure and magnetic properties of our sample can be tuned by the density of the induced defects. These results provide better understanding of the hydrogenation effect and thus can be used in the future for materials processing to meet the requirements of different devices.
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11704167, 11704317, and 11574122).
Corresponding Authors:
Zhiwei Li, Tao Wang
E-mail: zweili@lzu.edu.cn;wtao@lzu.edu.cn
Cite this article:
Hui Wang(王辉), Meng Wu(吴猛), Haiping Zhou(周海平), Bo Zhang(张博), Shixin Hu(胡世欣), Tianyong Ma(马天勇), Zhiwei Li(李志伟), Liang Qiao(乔亮), Tao Wang(王涛), and Fashen Li(李发伸) Effect of hydrogen plasma implantation on the micro-structure and magnetic properties of hcp-Co8057Fe4Ir16 thin films 2021 Chin. Phys. B 30 057505
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