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Chin. Phys. B, 2017, Vol. 26(12): 126801    DOI: 10.1088/1674-1056/26/12/126801
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES Prev   Next  

Segregations and desorptions of Ge atoms in nanocomposite Si1-xGex films during high-temperature annealing

Yu Wang(汪煜)1, Meng Yang(杨濛)1, Gang Wang(王刚)1, Xiao-Xu Wei(魏晓旭)1, Jun-Zhuan Wang(王军转)1, Yun Li(李昀)1, Ze-Wen Zou(左则文)2, You-Dou Zheng(郑有炓)1, Yi Shi(施毅)1
1. Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China;
2. College of Physics and Electronics Information, Anhui Normal University, Wuhu 241000, China
Abstract  Nanocomposite Si1-xGex films are deposited by dual-source jet-type inductively coupled plasma chemical vapor deposition (jet-ICPCVD). The segregations and desorptions of Ge atoms, which dominate the structural evolutions of the films during high-temperature annealing, are investigated. When the annealing temperature (Ta) is 900℃, the nanocomposite Si1-xGex films are well crystallized, and nanocrystals (NCs) with the core-shell structure form in the films. After being annealed at 1000℃ (above the melting point of bulk Ge), Ge atoms accumulate on the surfaces of Ge-rich films, whereas pits appear on films with lower Ge content, resulting from desorption. Meanwhile, voids are observed in the films. A cone-like structure involving the percolation of the homogeneous clusters and the crystallization of NCs enhances Ge segregation.
Keywords:  Si1-xGex      annealing      segregation      desorption  
Received:  18 August 2017      Revised:  31 August 2017      Accepted manuscript online: 
PACS:  68.55.-a (Thin film structure and morphology)  
  68.55.A- (Nucleation and growth)  
Corresponding Authors:  Yi Shi     E-mail:  yshi@nju.edu.cn

Cite this article: 

Yu Wang(汪煜), Meng Yang(杨濛), Gang Wang(王刚), Xiao-Xu Wei(魏晓旭), Jun-Zhuan Wang(王军转), Yun Li(李昀), Ze-Wen Zou(左则文), You-Dou Zheng(郑有炓), Yi Shi(施毅) Segregations and desorptions of Ge atoms in nanocomposite Si1-xGex films during high-temperature annealing 2017 Chin. Phys. B 26 126801

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