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Chin. Phys. B, 2014, Vol. 23(6): 066805    DOI: 10.1088/1674-1056/23/6/066805
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES Prev   Next  

Preparation and characterization of thick cubic boron nitride films

Wang Ming-E (王明娥)a b, Ma Guo-Jia (马国佳)a b, Dong Chuang (董闯)a, Gong Shui-Li (巩水利)b
a School of Material and Engineering, Dalian University of Technology, Dalian 116024, China;
b National Key Laboratory of Science and Technology on Power Beam Processes, Beijing AeronauticalManufacturing Technology Research Institute, Beijing 100024, China
Abstract  Cubic boron nitride (c-BN) films are prepared by the radio frequency magnetron sputtering technique. The stresses and crystallinities of the films are estimated by the Fourier transform infrared spectroscopy of c-BN samples, including the peak shifts and varieties of full widths at half maximum. The effects of the B-C-N interlayer and the two-stage deposition method on the c-BN films are investigated. Then the thick and stable c-BN films are prepared by a combination of the two methods. The properties of the interlayer and film are also characterized.
Keywords:  cubic BN films      B-C-N interlayer      stress      hardness  
Received:  15 September 2013      Revised:  09 December 2013      Accepted manuscript online: 
PACS:  68.55.A- (Nucleation and growth)  
  81.15.Hi (Molecular, atomic, ion, and chemical beam epitaxy)  
  68.35.B- (Structure of clean surfaces (and surface reconstruction))  
Corresponding Authors:  Dong Chuang     E-mail:  dong@dlut.edu.cn

Cite this article: 

Wang Ming-E (王明娥), Ma Guo-Jia (马国佳), Dong Chuang (董闯), Gong Shui-Li (巩水利) Preparation and characterization of thick cubic boron nitride films 2014 Chin. Phys. B 23 066805

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