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Chinese Physics, 2001, Vol. 10(13): 1-3    DOI:
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES   Next  

SINGLE-ELECTRON TRANSISTORS FOR FUTURE APPLICATIONS

Wang Tai-hong (李宏伟), Li Hong-wei (周均铭), Zhou Jun-ming
Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
Abstract  Single electron transistors with wire channels are fabricated by a nanoelectrode-pair technique. Their characteristics strongly depend on the channel widths and the voltages on the in-plane gates. A few dips in the Coulomb blockade oscillations were observed at the less positive gate voltages for a device with a 70nm-wide wire due to Coulomb blockade between the coupled dots. By applying negative voltages to the in-plane gates, the oscillations became periodic, which indicated the formation of a single dot in the conducting channel. These gates facilitate fabricating single-electron transistors with single dot structures, which have potential applications on its integration.
Keywords:  single-electron tunneling      Coulomb blockade      quantum dots  
Received:  01 January 2001      Revised:  06 February 2001      Accepted manuscript online: 
PACS:  7280E  
  7335C  
  7340G  
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 69925410 and 19904015).

Cite this article: 

Wang Tai-hong (李宏伟), Li Hong-wei (周均铭), Zhou Jun-ming SINGLE-ELECTRON TRANSISTORS FOR FUTURE APPLICATIONS 2001 Chinese Physics 10 1

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