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Surface defects, stress evolution, and laser damage enhancement mechanism of fused silica under oxygen-enriched condition |
| Wei-Yuan Luo(罗韦媛)1, Wen-Feng Sun(孙文丰)1, Bo Li(黎波)1,†, Xia Xiang(向霞)1,‡, Xiao-Long Jiang(蒋晓龙)2, Wei Liao(廖威)2, Hai-Jun Wang(王海军)2, Xiao-Dong Yuan(袁晓东)2, Xiao-Dong Jiang(蒋晓东)2, and Xiao-Tao Zu(祖小涛)1 |
1 School of Physics, University of Electronic Science and Technology of China, Chengdu 610054, China;
2 Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China |
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Abstract Oxygen ions (O+) were implanted into fused silica at a fixed fluence of 1×1017 ions/cm2 with different ion energies ranging from 10 keV to 60 keV. The surface roughness, optical properties, mechanical properties and laser damage performance of fused silica were investigated to understand the effect of oxygen ion implantation on laser damage resistance of fused silica. The ion implantation accompanied with sputtering effect can passivate the sub-/surface defects to reduce the surface roughness and improve the surface quality slightly. The implanted oxygen ions can combine with the structural defects (ODCs and E' centers) to reduce the defect densities and compensate the loss of oxygen in fused silica surface under laser irradiation. Furthermore, oxygen ion implantation can reduce the Si-O-Si bond angle and densify the surface structure, thus introducing compressive stress in the surface to strengthen the surface of fused silica. Therefore, the laser induced damage threshold of fused silica increases and the damage growth coefficient decreases when ion energy up to 30 keV. However, at higher ion energy, the sputtering effect is weakened and implantation becomes dominant, which leads to the surface roughness increase slightly. In addition, excessive energy aggravates the breaking of Si-O bonds. At the same time, the density of structural defects increases and the compressive stress decreases. These will degrade the laser laser-damage resistance of fused silica. The results indicate that oxygen ion implantation with appropriate ion energy is helpful to improve the damage resistance capability of fused silica components.
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Received: 21 January 2021
Revised: 25 February 2022
Accepted manuscript online:
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PACS:
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42.70.Ce
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(Glasses, quartz)
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68.35.Dv
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(Composition, segregation; defects and impurities)
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78.68.+m
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(Optical properties of surfaces)
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81.65.-b
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(Surface treatments)
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| Fund: Project supported by the National Natural Science Foundation of China (Grant No.12105037) and the Key Project of National Natural Science Foundation of China-China Academy of Engineering Physics Joint Foundation (Grant No.U1830204). |
Corresponding Authors:
Bo Li,E-mail:libcx@uestc.edu.cn;Xia Xiang,E-mail:xiaxiang@uestc.edu.cn
E-mail: libcx@uestc.edu.cn;xiaxiang@uestc.edu.cn
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| About author: 2022-3-3 |
Cite this article:
Wei-Yuan Luo(罗韦媛), Wen-Feng Sun(孙文丰), Bo Li(黎波), Xia Xiang(向霞), Xiao-Long Jiang(蒋晓龙),Wei Liao(廖威), Hai-Jun Wang(王海军), Xiao-Dong Yuan(袁晓东),Xiao-Dong Jiang(蒋晓东), and Xiao-Tao Zu(祖小涛) Surface defects, stress evolution, and laser damage enhancement mechanism of fused silica under oxygen-enriched condition 2022 Chin. Phys. B 31 054214
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