Field emissions of graphene films deposited on different substrates by CVD system

doi:10.1088/1674-1056/21/12/128102

Abstract Graphene films are deposited on copper (Cu) and aluminum (Al) substrates, respectively, by using microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a field emission type scanning electron microscope (FE-SEM), Raman spectra, and field emission (FE) I-V measurements. It is found that the surface morphologies of the films deposited on Cu and Al substrates are different: the field emission property of graphene film deposited on Cu substrate is better than that on Al substrate, and the lowest turn-on field of 2.4 V/μm is obtained for graphene film deposited on Cu substrate. The macroscopic areas of the graphene samples are all above 400 mm².

Keywords: graphene chemical vapour deposition field emission

Received: 13 May 2012
Revised: 18 June 2012
Accepted manuscript online:

PACS:	81.05.ue	(Graphene)
	52.77.-j	(Plasma applications)
	79.60.Jv	(Interfaces; heterostructures; nanostructures)
	79.70.+q	(Field emission, ionization, evaporation, and desorption)

Fund: Project supported by the Shanghai Human Resources and Social Security Bureau, China (Grant No. 2009023).

Corresponding Authors: Wang Xiao-Ping
E-mail: wxpchina64@yahoo.com.cn

Cite this article:

Wang Xiao-Ping (王小平), Liu Xiao-Fei (刘晓菲), Liu Xin-Xin (刘欣欣), Wang Li-Jun (王丽军), Yang Can (杨灿), Jing Long-Wei (井龙伟), Li Song-Kun (李松坤), Pan Xiu-Fang (潘秀芳) Field emissions of graphene films deposited on different substrates by CVD system 2012 Chin. Phys. B 21 128102

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