Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry

doi:10.1088/1674-1056/21/1/010701

Abstract The effect of a spherical shape on the measurement result of spectroscopic ellipsometry (SE) is analyzed, and a method to eliminate this effect is proposed. Based on the simulation result of the SE measurement on a silicon sphere by ray tracking, we find that the sphere makes the parallel incident beam of the SE be divergent after reflection, and the measurement error of the SE caused by this phenomenon is explained by the mixed polarization theory. By settling an aperture in front of the detector of the SE, we can almost eliminate the error. For the silicon sphere with a diameter of 94 mm used in the Avogadro project, the thickness error of the oxide layer caused by the spherical shape can be reduced from 0.73 nm to 0.04 nm by using the proposed method. The principle of the method and the results of the experimental verification are presented.

Keywords: spectroscopic ellipsometry silicon sphere Avogadro constant metrology

Received: 15 June 2011
Revised: 07 July 2011
Accepted manuscript online:

PACS:	07.60.Fs	(Polarimeters and ellipsometers)
	06.20.Jr	(Determination of fundamental constants)
	06.20.-f	(Metrology)

Fund: Project supported by the National Key Technology Research and Development Program of the Ministry of Science and Technology of China (Grant No. 2006BAF06B06) and the Tsinghua University Initiative Scientific Research Program, China (Grant No. 2009THZ06057

Cite this article:

Zhang Ji-Tao(张继涛), Wu Xue-Jian(吴学健), and Li Yan(李岩) Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry 2012 Chin. Phys. B 21 010701

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Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry

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