Abstract Carbon nitride thin films were prepared by electron-beam evaporation assisted with nitrogen ion bombardment and TiN/CNx composite films were by unbalanced dc magnetron sputtering, respectively. It was found that the sputtered films were better than the evaporated films in hardness and adhesion. The experiments of atomic oxygen action, cold welding, friction and wearing were emphasized, and the results proved that the sputtered TiN/CNx composite films were suitable for space application.
Received: 15 October 2005
Revised: 25 April 2006
Accepted manuscript online:
Feng Yu-Dong(冯煜东), Xu Chao(胥超), Wang Yi(王艺), and Zhang Fu-Jia(张福甲) Deposition of carbon nitride films for space application 2006 Chinese Physics 15 1888
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