Please wait a minute...
Chin. Phys. B, 2019, Vol. 28(7): 077801    DOI: 10.1088/1674-1056/28/7/077801
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Prev   Next  

Influence of annealing treatment on the luminescent properties of Ta:β-Ga2O3 single crystal

Xiaowei Yu(余小威)1, Huiayuan Cui(崔慧源)2, Maodong Zhu(朱茂东)2, Zhilin Xia(夏志林)1, Qinglin Sai(赛青林)2
1 School of Material Science and Engineering, Wuhan University of Technology, Wuhan 430070, China;
2 Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Abstract  

Ta5+ doped β-Ga2O3 single crystals were grown by using the optical floating zone method, and then annealed in the air and nitrogen gas at 1400℃ for 20 hours. The transmittance spectra, photoluminescence (PL), x-ray irradiation spectra, and PL decay profiles of the samples were measured at room temperature. The relevant results show that the optical transmittance of the samples annealed in the air or nitrogen gas was improved. By drawing the (ahv)2-hv graph, it can be seen that the band gap decreased after being annealed in the air, but increased in nitrogen gas. The PL spectra and x-ray irradiation spectra show that the luminescent intensity of the sample annealed in the air increased substantially, while decreased for the sample annealed in nitrogen. The PL decay time of the Ta:β-Ga2O3 annealed in the air increased significantly compared with that of the Ta:β-Ga2O3 sample without annealing, but the tendency after annealing in nitrogen gas was opposite.

Keywords:  Ta:β-Ga2O3      floating zone method      transmittance spectra      annealing  
Received:  28 March 2019      Revised:  07 May 2019      Accepted manuscript online: 
PACS:  78.40.Fy (Semiconductors)  
  78.55.-m (Photoluminescence, properties and materials)  
Fund: 

Project supported by the National Natural Science Foundation of China (Grant No. 51802327) and the Science and Technology Commission of Shanghai Municipality, China (Grant No. 18511110500).

Corresponding Authors:  Zhilin Xia, Qinglin Sai     E-mail:  xiazhilin@whut.edu.cn;saiql@siom.ac.cn

Cite this article: 

Xiaowei Yu(余小威), Huiayuan Cui(崔慧源), Maodong Zhu(朱茂东), Zhilin Xia(夏志林), Qinglin Sai(赛青林) Influence of annealing treatment on the luminescent properties of Ta:β-Ga2O3 single crystal 2019 Chin. Phys. B 28 077801

[1] Mu W X, Jia Z T, Yin Y R, Hu Q Q, Li Y, Wu B Y, Zhang J and Tao X T 2017 J. Alloys Compd. 714 453
[2] Galazka Z, Ganschow S, Fiedler A, Bertram R, Klimm D, Irmscher K, Schewski R, Pietsch M, Albrecht M and Bickermann M 2018 J. Cryst. Growth 486
[3] Guo X Y, Xu D P, Ding Z H and Su W H 2006 Chin. Phys. Lett. 23 1645
[4] Higashiwaki M, Sasaki K, Murakami H, Kumagai Y, Koukitu A, Kuramata A, Masui T and Yamakoshi S 2016 Semicond. Sci. Tech. 31 034001
[5] Schreiber P, Dang T, Pickenpaugh T, Smith G, Gehred P and Litton C 1999 Proc. SPIE 3629 230
[6] Usui Y, Nakauchi D, Kawano N, Okada G, Kawaguchi N and Yanagida T 2018 J. Phys. Chem. Solids 117 36
[7] Ho Q D, Frauenheim T and Deák P 2018 Phys. Rev. B 97 115163
[8] Usui Y, Oya T, Okada G, Kawaguchi N and Yanagida T 2017 Mater. Res. Bull. 90 266
[9] Varley J B, Weber J R, Janotti A and Vandewalle C 2010 Appl. Phys. Lett. 97 142106
[10] Cui H Y, Mohamed H F, Xia C T, Sai Q L, Zhou W, Qi H J, Zhao J T, Si J L and Ji X L 2019 J. Alloys Compd. 788 925928
[11] Li B, Zeng L and Zhang F S 2002 Acta Opt. Sin. 22 11
[12] Son N T, Goto K, Nomura K, Thieu, Q T, Togashi R, Murakami H, Kumagai Y, Kuramata A, Higashiwaki M, Koukitu A, Yamakoshi S, Monemar B and Janzen E 2016 J. Appl. Phys. 120 235703
[13] Zhang J G, Xia C T, Deng Q, Xu W S, Shi H S, Wu F and Xu J 2006 J. Phys. Chem. Solids 67 1656
[14] Wang L L, Xia C T, Sai Q L, Di J Q and Mou F 2013 J. Synth. Cryst. 42 607
[15] Yanagida T, Okada G, Kato T, Nakauchi D and Yanagida S 2016 Appl. Phys. Express 9 042601
[16] Onuma T, Fujioka S, Yamaguchi T, Higashiwaki M, Sasaki K, Masui T and Honda T 2013 Appl. Phys. Lett. 103 041910
[17] He N, Tang H L, Liu B, Zhu Z C, Li Q, Guo C, Gu M, Xu J, Liu J L, Xu M X, Chen L and Ouyang X P 2018 Nucl. Instrum. Methods Phys. Res. 888 9
[1] Phosphorus diffusion and activation in fluorine co-implanted germanium after excimer laser annealing
Chen Wang(王尘), Wei-Hang Fan(范伟航), Yi-Hong Xu(许怡红), Yu-Chao Zhang(张宇超), Hui-Chen Fan(范慧晨), Cheng Li(李成), and Song-Yan Cheng(陈松岩). Chin. Phys. B, 2022, 31(9): 098503.
[2] Introducing voids around the interlayer of AlN by high temperature annealing
Jianwei Ben(贲建伟), Jiangliu Luo(罗江流), Zhichen Lin(林之晨), Xiaojuan Sun(孙晓娟), Xinke Liu(刘新科), and Xiaohua Li(黎晓华). Chin. Phys. B, 2022, 31(7): 076104.
[3] Construction and mechanism analysis on nanoscale thermal cloak by in-situ annealing silicon carbide film
Jian Zhang(张健), Hao-Chun Zhang(张昊春), Zi-Liang Huang(黄子亮), Wen-Bo Sun(孙文博), and Yi-Yi Li(李依依). Chin. Phys. B, 2022, 31(1): 014402.
[4] Protection of isolated and active regions in AlGaN/GaN HEMTs using selective laser annealing
Mingchen Hou(侯明辰), Gang Xie(谢刚), Qing Guo(郭清), and Kuang Sheng(盛况). Chin. Phys. B, 2021, 30(9): 097302.
[5] In-situ TEM observation of the evolution of helium bubbles in Mo during He+ irradiation and post-irradiation annealing
Yi-Peng Li(李奕鹏), Guang Ran(冉广), Xin-Yi Liu(刘歆翌), Xi Qiu(邱玺), Qing Han(韩晴), Wen-Jie Li(李文杰), and Yi-Jia Guo(郭熠佳). Chin. Phys. B, 2021, 30(8): 086109.
[6] Impact of O2 post oxidation annealing on the reliability of SiC/SiO2 MOS capacitors
Peng Liu(刘鹏), Ji-Long Hao(郝继龙), Sheng-Kai Wang(王盛凯), Nan-Nan You(尤楠楠), Qin-Yu Hu(胡钦宇), Qian Zhang(张倩), Yun Bai(白云), and Xin-Yu Liu(刘新宇). Chin. Phys. B, 2021, 30(7): 077303.
[7] Fabrication and characterization of Al-Mn superconducting films for applications in TES bolometers
Qing Yu(余晴), Yi-Fei Zhang(张翼飞), Chang-Hao Zhao(赵昌昊), Kai-Yong He(何楷泳), Ru-Tian Huang(黄汝田), Yong-Cheng He(何永成), Xin-Yu Wu(吴歆宇), Jian-She Liu(刘建设), and Wei Chen(陈炜). Chin. Phys. B, 2021, 30(7): 077402.
[8] Crystal growth, structure and optical properties of Pr3+-doped yttria-stabilized zirconia single crystals
Dai-Ni Wang(王黛妮), Shou-Lei Xu(徐守磊), Xiang-Yu Wang(王翔宇), Si-Yao Li(李思瑶), Xing Hong(洪杏), Bernard A. Goodman, and Wen Deng(邓文). Chin. Phys. B, 2021, 30(7): 078103.
[9] Effects of post-annealing on crystalline and transport properties of Bi2Te3 thin films
Qi-Xun Guo(郭奇勋), Zhong-Xu Ren(任中旭), Yi-Ya Huang(黄意雅), Zhi-Chao Zheng(郑志超), Xue-Min Wang(王学敏), Wei He(何为), Zhen-Dong Zhu(朱振东), and Jiao Teng(滕蛟). Chin. Phys. B, 2021, 30(6): 067307.
[10] Understanding the synergistic effect of mixed solvent annealing on perovskite film formation
Kun Qian(钱昆), Yu Li(李渝), Jingnan Song(宋静楠), Jazib Ali, Ming Zhang(张明), Lei Zhu(朱磊), Hong Ding(丁虹), Junzhe Zhan(詹俊哲), and Wei Feng(冯威). Chin. Phys. B, 2021, 30(6): 068103.
[11] Quantum annealing for semi-supervised learning
Yu-Lin Zheng(郑玉鳞), Wen Zhang(张文), Cheng Zhou(周诚), and Wei Geng(耿巍). Chin. Phys. B, 2021, 30(4): 040306.
[12] Design and fabrication of GeAsSeS chalcogenide waveguides with thermal annealing
Limeng Zhang(张李萌), Jinbo Chen(陈锦波), Jierong Gu(顾杰荣), Yixiao Gao(高一骁), Xiang Shen(沈祥), Yimin Chen(陈益敏), and Tiefeng Xu(徐铁峰). Chin. Phys. B, 2021, 30(3): 034210.
[13] Characterization of low-resistance ohmic contacts to heavily carbon-doped n-type InGaAsBi films treated by rapid thermal annealing
Shu-Xing Zhou(周书星), Li-Kun Ai(艾立鹍), Ming Qi(齐鸣), An-Huai Xu(徐安怀), Jia-Sheng Yan(颜家圣), Shu-Sen Li(李树森), and Zhi Jin(金智). Chin. Phys. B, 2021, 30(2): 027304.
[14] Preparation of graphene on SiC by laser-accelerated pulsed ion beams
Danqing Zhou(周丹晴), Dongyu Li(李东彧), Yuhan Chen(陈钰焓), Minjian Wu(吴旻剑), Tong Yang(杨童), Hao Cheng(程浩), Yuze Li(李昱泽), Yi Chen(陈艺), Yue Li(李越), Yixing Geng(耿易星), Yanying Zhao(赵研英), Chen Lin(林晨), Xueqing Yan(颜学庆), and Ziqiang Zhao(赵子强). Chin. Phys. B, 2021, 30(11): 116106.
[15] Erratum to "Fabrication of Tl2Ba2CaCu2O8 superconducting films without thallium pellets"
Teng-Da Xu(徐腾达), Jian Xing(邢建), Li-Tian Wang(王荔田), Jin-Li Zhang(张金利), Sheng-Hui Zhao(赵生辉), Yang Xiong(熊阳), Xin-Jie Zhao(赵新杰), Lu Ji(季鲁), Xu Zhang(张旭), and Ming He(何明). Chin. Phys. B, 2021, 30(1): 019901.
No Suggested Reading articles found!