Amine-containing film deposited in pulsed dielectric barrier discharge at a high pressure and its cell adsorption behaviours
Hu Wen-Juan(胡文娟)a), Xie Fen-Yan(谢芬艳)a), Chen Qiang(陈强)a)†, and Weng Jing(翁静)b)
a Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China; b School of Basic Medical Sciences, Capital Medical University, Beijing 100069, China
Abstract With monomer allylamine, amine-containing functional films were prepared in alternative current pulsed dielectric barrier discharge (DBD) at a high pressure. This paper analyses in detail the film properties and structures, such as hydrophilicity, compounds and microstructures as well as amine density by the water contact angle, Fourier transform infrared spectroscopy, atomic force microscopy, and ultraviolet--visible measurement. The influence of discharge parameters, in particular applied power, on amine density was investigated. As an application the cell adsorption behaviours on plasma polymerization films was performed in-vitro. The results show that at a high pressure pulsed DBD plasma can polymerize films with sufficient amine group on surface, through which the very efficient cell adsorption behaviours was demonstrated, and the high rate of cell proliferation was visualized.
Received: 07 June 2008
Revised: 13 August 2008
Accepted manuscript online:
PACS:
81.15.-z
(Methods of deposition of films and coatings; film growth and epitaxy)
Fund: Project supported by the National Natural Science Foundation
of China (Grant No 10775017), and Funding Project for Academic Human Resources Development
in Institutions of Higher Learning under the Jurisdiction of Beijing Municipality.
Cite this article:
Hu Wen-Juan(胡文娟), Xie Fen-Yan(谢芬艳), Chen Qiang(陈强), and Weng Jing(翁静) Amine-containing film deposited in pulsed dielectric barrier discharge at a high pressure and its cell adsorption behaviours 2009 Chin. Phys. B 18 1276
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