Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles

doi:10.1088/1674-1056/25/4/048101

Abstract The a-C and a-C:H films are deposited on silicon surfaces modified with and without nickel nanoparticles by using mid-frequency magnetron sputtering. The microstructures and morphologies of the films are analyzed by Raman spectroscopy and atomic force microscopy. Field emission behaviors of the deposited films with and without nickel nanoparticles modification are comparatively investigated. It is found that the hydrogen-free carbon film exhibits a high field emission current density and low turn-on electric field compared with the hydrogenated carbon film. Nickel modifying could increase the current density, whereas it has no significant effect on the turn-on electric field. The mechanism of field electron emission of a sample is discussed from the surface morphologies of the films and nickel nanoparticle roles in the interface between film and substrate.

Keywords: DLC films field emission magnetron sputtering nickel nanoparticles modification

Received: 13 October 2015
Revised: 01 December 2015
Accepted manuscript online:

PACS:	81.05.U-	(Carbon/carbon-based materials)
	79.70.+q	(Field emission, ionization, evaporation, and desorption)
	81.15.Cd	(Deposition by sputtering)

Fund: Project supported by the National Natural Science Foundation of China (Grant No. 51105186).

Corresponding Authors: Jin-Long Jiang
E-mail: golden_dragon@126.com

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Jin-Long Jiang(姜金龙), Yu-Bao Wang(王玉宝), Qiong Wang(王琼), Hao Huang(黄浩), Zhi-Qiang Wei(魏智强), Jun-Ying Hao(郝俊英) Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles 2016 Chin. Phys. B 25 048101

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Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles

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