Thickness dependence of the optical constants of oxidized copper thin films based on ellipsometry and transmittance

doi:10.1088/1674-1056/23/8/087802

Abstract Thin oxidized copper films in various thickness values are deposited onto quartz glass substrates by electron beam evaporation. The ellipsometry parameters and transmittance in a wavelength range of 300 nm-1000 nm are collected by a spectroscopic ellipsometer and a spectrophotometer respectively. The effective thickness and optical constants, i.e., refractive index n and extinction coefficient k, are accurately determined by using newly developed ellipsometry combined with transmittance iteration method. It is found that the effective thickness determined by this method is close to the physical thickness and has obvious difference from the mass thickness for very thin film due to variable density of film. Furthermore, the thickness dependence of optical constants of thin oxidized Cu films is analyzed.

Keywords: thin film optical constants thickness copper

Received: 04 September 2013
Revised: 20 March 2014
Accepted manuscript online:

PACS:	78.20.Ci	(Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity))
	68.47.Gh	(Oxide surfaces)
	68.55.jd	(Thickness)
	68.47.De	(Metallic surfaces)

Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11074232, 10874160, and 21002097) and the National Basic Research Program of China (Grant Nos. 2011CB932801 and 2012CB933702).

Corresponding Authors: Zhang Zeng-Ming
E-mail: zzm@ustc.edu.cn

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Gong Jun-Bo (宫俊波), Dong Wei-Le (董伟乐), Dai Ru-Cheng (代如成), Wang Zhong-Ping (王中平), Zhang Zeng-Ming (张增明), Ding Ze-Jun (丁泽军) Thickness dependence of the optical constants of oxidized copper thin films based on ellipsometry and transmittance 2014 Chin. Phys. B 23 087802

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Thickness dependence of the optical constants of oxidized copper thin films based on ellipsometry and transmittance

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