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Investigation of inhomogeneous barrier height of Au/Bi4Ti3O12/n-Si structure through Gaussian distribution of barrier height |
M. Gökcen, M. Yildirim |
Department of Physics, Faculty of Arts and Sciences, Düzce University, Düzce, Turkey |
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Abstract Au/Bi4Ti3O12/n-Si structure is fabricated in order to investigate its current-voltage (I-V) characteristics in a temperature range of 300 K-400 K. Obtained I-V data are evaluated by thermionic emission (TE) theory. Zero-bias barrier height (ΦB0) and ideality factor (n) calculated from I-V characteristics, are found to be temperature-dependent such that ΦB0 increases with temperature increasing, whereas n decreases. Obtained temperature dependence of ΦB0 and linearity in ΦB0 versus n plot, together with lower barrier height and Richardson constant values obtained from Richardson plot, indicate that the barrier height of the structure is inhomogeneous in nature. Therefore, I-V characteristics are explained on the basis of Gaussian distribution of barrier height.
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Received: 19 June 2012
Revised: 24 July 2012
Accepted manuscript online:
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PACS:
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85.30.Hi
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(Surface barrier, boundary, and point contact devices)
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85.30.Kk
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(Junction diodes)
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84.37.+q
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(Measurements in electric variables (including voltage, current, resistance, capacitance, inductance, impedance, and admittance, etc.))
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73.40.-c
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(Electronic transport in interface structures)
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Fund: Project supported by the Düzce University Scientific Research Project (Grant Nos. 2010.05.02.056 and 2012.05.02.110). |
Corresponding Authors:
M. Gökcen
E-mail: muharremgokcen@duzce.edu.tr
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Cite this article:
M. Gökcen, M. Yildirim Investigation of inhomogeneous barrier height of Au/Bi4Ti3O12/n-Si structure through Gaussian distribution of barrier height 2012 Chin. Phys. B 21 128502
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