Abstract Silicon-based microelectrodes have been confirmed to be helpful in neural prostheses. The fabricated 7-channel silicon-based microelectrode was feasible to be implanted into the brain cortex. The manufacturing process by micro-electromechanical system (MEMS) technology was detailed with four photolithographic masks. The microscopic photographs and SEM images indicated that the probe shank was 3mm long, 100$\mu$m wide and 20$\mu$ m thick with the recording sites spaced 120$\mu$ m apart for good signal isolation. To facilitate the insertion and minimize the trauma, the microelectrode is narrowed down gradually near the tip with the tip taper angle of 6 degrees. Curve of the single recording site impedance versus frequency was shown by test in vitro and the impedance declined from 150.5k$\Omega$ to 6.0k$\Omega$ with frequency changing from 10 k to 10MHz.
Received: 12 June 2006
Revised: 13 November 2006
Accepted manuscript online:
Fund: Project supported by the National
High Technology Research and Development Program of China (Grant No
2005AA311030) and the National Natural Science Foundation of China
(Grant No 60536030).
Cite this article:
Sui Xiao-Hong(隋晓红), Zhang Ruo-Xin(张若昕), Pei Wei-Hua(裴为华), and Chen Hong-Da(陈弘达) A novel implantable multichannel silicon-based microelectrode 2007 Chinese Physics 16 2116
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