Secondary electron yield of air-exposed ALD-Al2O3 coating on Ag-plated aluminum alloy

doi:10.1088/1674-1056/ad71b3

Abstract Secondary electron yield (SEY) of air-exposed metals tends to be increased because of air-formed oxide, hydrocarbon, and other contaminants. This enhances the possibility of secondary electron multipacting in high-power microwave systems, resulting in undesirable occurrence of discharge damage. Al$_{2}$O$_{3}$ coatings have been utilized as passive and protective layers on device packages to provide good environmental stability. We employed atomic layer deposition (ALD) to produce a series of uniform Al$_{2}$O$_{3}$ coatings with appropriate thickness on Ag-plated aluminum alloy. The secondary electron emission characteristics and their variations during air exposure were observed. The escape depth of secondary electron needs to exceed the coating thickness to some extent in order to demonstrate SEY of metallic substrates. Based on experimental and calculated results, the maximum SEY of Ag-plated aluminum alloy had been maintained at 2.45 over 90 days of exposure without obvious degradation by applying 1 nm Al$_{2}$O$_{3}$ coatings. In comparison, the peak SEY of untreated Ag-plated aluminum alloy grew from an initial 2.33 to 2.53, exceeding that of the 1 nm Al$_{2}$O$_{3}$ sample. The ultra-thin ALD-Al$_{2}$O$_{3}$ coating substantially enhanced the SEY stability of metal materials, with good implications for the environmental dependability of spacecraft microwave components.

Keywords: secondary electron yield (SEY) atomic layer deposition air exposure multipactor

Received: 03 June 2024
Revised: 19 August 2024
Accepted manuscript online: 21 August 2024

PACS:	37.20.+j	(Atomic and molecular beam sources and techniques)
	79.20.Hx	(Electron impact: secondary emission)
	68.37.-d	(Microscopy of surfaces, interfaces, and thin films)

Fund: Project supported by the Sustainedly Supported Foundation by National Key Laboratory of Science and Technology on Space Microwave (Grant No. HTKJ2023KL504001) and the National Natural Science Foundation of China (Grant No. 62101434).

Corresponding Authors: Wan-Zhao Cui
E-mail: cuiwanzhao@126.com

Cite this article:

Xue-Man Wan(万雪曼), Tian-Cun Hu(胡天存), Jing Yang(杨晶), Na Zhang(张娜), Yun He(何鋆), and Wan-Zhao Cui(崔万照) Secondary electron yield of air-exposed ALD-Al₂O₃ coating on Ag-plated aluminum alloy 2024 Chin. Phys. B 33 113701

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Secondary electron yield of air-exposed ALD-Al2O3 coating on Ag-plated aluminum alloy

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Secondary electron yield of air-exposed ALD-Al₂O₃ coating on Ag-plated aluminum alloy