Analysis of secondary electron emission using the fractal method

doi:10.1088/1674-1056/abc2be

Abstract Based on the rough surface topography with fractal parameters and the Monte-Carlo simulation method for secondary electron emission properties, we analyze the secondary electron yield (SEY) of a metal with rough surface topography. The results show that when the characteristic length scale of the surface, G, is larger than 1× 10^-7, the surface roughness increases with the increasing fractal dimension D. When the surface roughness becomes larger, it is difficult for entered electrons to escape surface. As a result, more electrons are collected and then SEY decreases. When G is less than 1× 10^-7, the effect of the surface topography can be ignored, and the SEY almost has no change as the dimension D increases. Then, the multipactor thresholds of a C-band rectangular impedance transfer and an ultrahigh-frequency-band coaxial impedance transfer are predicted by the relationship between the SEY and the fractal parameters. It is verified that for practical microwave devices, the larger the parameter G is, the higher the multipactor threshold is. Also, the larger the value of D, the higher the multipactor threshold.

Keywords: secondary electron emission yield the fractal method multipactor

Received: 22 July 2020
Revised: 04 September 2020
Accepted manuscript online: 20 October 2020

PACS:	79.20.Hx	(Electron impact: secondary emission)
	05.45.Df	(Fractals)
	52.80.Pi	(High-frequency and RF discharges)

Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. U1537211 and 61901361).

Corresponding Authors: ^†Corresponding author. E-mail: cuiwanzhao@126.com

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Chun-Jiang Bai(白春江), Tian-Cun Hu(胡天存), Yun He(何鋆), Guang-Hui Miao(苗光辉), Rui Wang(王瑞), Na Zhang(张娜), and Wan-Zhao Cui(崔万照) Analysis of secondary electron emission using the fractal method 2021 Chin. Phys. B 30 017901

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