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Characteristic enhancement in tunnel field-effect transistors via introduction of vertical graded source |
Zhijun Lyu(吕智军)1, Hongliang Lu(吕红亮)1, Yuming Zhang(张玉明)1, Yimen Zhang(张义门)1, Bin Lu(芦宾)2, Yi Zhu(朱翊)1, Fankang Meng(孟凡康)1, Jiale Sun(孙佳乐)1 |
1 The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071, China; 2 School of Physics and Information Engineering, Shanxi Normal University, Linfen 041004, China |
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Abstract A novel vertical graded source tunnel field-effect transistor (VGS-TFET) is proposed to improve device performance. By introducing a source with linearly graded component, the on-state current increases by more than two decades higher than that of the conventional GaAs TFETs without sacrificing the subthreshold swing (SS) due to the improved band-to-band tunneling efficiency. Compared with the conventional TFETs, much larger drive current range can be achieved by the proposed VGS-TFET with SS below the thermionic limitation of 60 mV/dec. Furthermore, the minimum SS about 20 mV/dec indicates its promising potential for further ultralow power applications.
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Received: 23 December 2019
Revised: 05 February 2020
Accepted manuscript online:
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PACS:
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85.30.Mn
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(Junction breakdown and tunneling devices (including resonance tunneling devices))
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81.05.Ea
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(III-V semiconductors)
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85.30.Tv
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(Field effect devices)
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Fund: Project supported by the National Natural Science Foundation of China (Grant No. 90304190002). |
Corresponding Authors:
Hongliang Lu
E-mail: hllv@mail.xidian.edu.cn
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Cite this article:
Zhijun Lyu(吕智军), Hongliang Lu(吕红亮), Yuming Zhang(张玉明), Yimen Zhang(张义门), Bin Lu(芦宾), Yi Zhu(朱翊), Fankang Meng(孟凡康), Jiale Sun(孙佳乐) Characteristic enhancement in tunnel field-effect transistors via introduction of vertical graded source 2020 Chin. Phys. B 29 058501
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