Study of hysteresis behavior in reactive sputtering of cylindrical magnetron plasma
H. Kakatia, S. M. Borahb
a Jorhat Institute of Science and Technology, Jorhat 10, Assam, India; b Department of Applied Sciences, Gauhati University, Jalukbari, Guwahati-781014, Assam, India
Abstract In order to make sufficient use of reactive cylindrical magnetron plasma for depositing compound thin films, it is necessary to characterize the hysteresis behavior of the discharge. Cylindrical magnetron plasmas with different targets namely titanium and aluminium are studied in an argon/oxygen and an argon/nitrogen gas environment respectively. The aluminium and titanium emission lines are observed at different flows of reactive gases. The emission intensity is found to decrease with the increase of the reactive gas flow rate. The hysteresis behavior of reactive cylindrical magnetron plasma is studied by determining the variation of discharge voltage with increasing and then reducing the flow rate of reactive gas, while keeping the discharge current constant at 100 mA. Distinct hysteresis is found to be formed for the aluminium target and reactive gas oxygen. For aluminium/nitrogen, titanium/oxygen and titanium/nitrogen, there is also an indication of the formation of hysteresis; however, the characteristics of variation from metallic to reactive mode are different in different cases. The hysteresis behaviors are different for aluminium and titanium targets with the oxygen and nitrogen reactive gases, signifying the difference in reactivity between them. The effects of the argon flow rate and magnetic field on the hysteresis are studied and explained.
Fund: Project supported by the Department of Science and Technology, Government of India and Council of Scientific and Industrial Research, India.
Corresponding Authors:
S. M. Borah
E-mail: sankarmoni@gmail.com
Cite this article:
H. Kakati, S. M. Borah Study of hysteresis behavior in reactive sputtering of cylindrical magnetron plasma 2015 Chin. Phys. B 24 125201
[1]
Mednikarov B, Spasov G and Babeva T 2005 J. Optoelectron. Adv. Mater. 7 1421
[2]
Bielawski M 2006 Surf. Coat. Technol. 200 3987
[3]
Sarakinos K, Alami J, Karimi P M, Severin D and Wuttig M 2007 J. Phys. D: Appl. Phys. 40 778
[4]
Jayaraj M K, Antony A and Ramachandran M 2002 Bull. Mater. Sci. 25 227
[5]
Schmidt N W, Totushek T S, Kimes W A, Callender D R and Doyle J R 2003 J. Appl. Phys. 94 5514
[6]
Wohlmuth W and Adesida I 2005 Thin Solid Films 479 223
[7]
Reddy Y K V, Mergel D, Reuter S, Buck V and Sulkowski M 2006 J. Phys. D: Appl. Phys. 39 1161
[8]
Tomozeiu N 2006 J. Optoelectron. Adv. Mater. 8 769
[9]
Kakati H, Pal A R, Bailung H and Chutia J 2007 J. Appl. Phys. 101 083304
[10]
Kakati H, Pal A R, Bailung H and Chutia J 2009 Appl. Surf. Sci. 255 7403
[11]
Arnell R D, Colligon J S, Minnebaev K F and Yurasova V E 1996 Vacuum 47 425
[12]
Diesselberg M, Stock H R and Mayr P 2004 Surf. Coat. Technol. 177 399
[13]
Borah S M, Pal A R, Bailung H and Chutia J 2008 Appl. Surf. Sci. 254 5760
[14]
Gardner R A, Peterson P J and Kennedy T N 1997 J. Vac. Sci. Technol. 14 1139
[15]
Nowicki R S 1997 J. Vac. Sci. Technol. 14 127
[16]
Pratt I H 1969 Thin Solid Films 3 R23
[17]
Deshpandey C, Holland L 1982 Thin Solid Films 96 265
[18]
Goranchev B, Orlinov V, Tsaneva V and Petrov I 1978 Thin Solid Films 52 365
[19]
Thornton J A and Lamb J L 1981 Thin Solid Films 83 377
[20]
Bhatia C S, Guthmiller G and Spool A M 1989 J. Vac. Sci. Technol. A 7 1298
[21]
Roth T, Kloos K H and Broszeit E 1987 Thin Solid Films 153 123
[22]
Morkoc H, Strite S, Gao G B, Lin M E, Sverdlov B and Burns M 1994 J. Appl. Phys. 76 1363
[23]
Edgar J H 1992 J. Mater. Res. 7 235
[24]
Berg S and Nyberg T 2005 Thin Solid Films 476 215
[25]
Borah S M, Bailung H, Pal A R and Chutia J 2008 J. Phys. D: Appl. Phys. 41 195205
[26]
Borah S M, Bailung H and Chutia J 2010 Prog. Color Colorants Coat. 3 74
[27]
Borah S M, Pal A R, Bailung H and Chutia J 2011 Chin. Phys. B 20 014701
[28]
Borah S M 2013 J. Mater. 2013 852859
[29]
Borah S M 2014 J. Phys. Sci. Appl. 4 440
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