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The properties of transparent conducting molybdenum-doped ZnO films grown by radio frequency magnetron sputtering |
Xiu Xian-Wu(修显武)a)† and Zhao Wen-Jing(赵文静)b) |
a. School of Physics and Electronics, Shandong Normal University, Jinan 250014, China; b. Jinan No.3 Vocational School, Jinan 250001, China |
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Abstract Transparent conducting molybdenum-doped zinc oxide films are prepared by radio frequency (RF) magnetron sputtering at ambient temperature. The MoO3 content in the target varies from 0 to 5 wt%, and each film is polycrystalline with a hexagonal structure and a preferred orientation along the c axis. The resistivity first decreases and then increases with the increase in MoO3 content. The lowest resistivity achieved is 9.2 × 10-4 Ω·cm, with a high Hall mobility of 30 cm2·V-1·s-1 and a carrier concentration of 2.3 × 1020 cm-3 at an MoO3 content of 2 wt%. The average transmittance in the visible range is reduced from 91% to 80% with the increase in the MoO3 content in the target.
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Received: 01 November 2011
Revised: 25 December 2011
Accepted manuscript online:
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PACS:
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68.55.Ln
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(Defects and impurities: doping, implantation, distribution, concentration, etc.)
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73.61.Ga
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(II-VI semiconductors)
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78.30.Fs
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(III-V and II-VI semiconductors)
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Fund: Project supported by the Science Foundation of the Education Commission of Shandong Province, China (Grant No. J10LA04). |
Corresponding Authors:
Xiu Xian-Wu
E-mail: xwxiu@sdnu.edu.cn
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Cite this article:
Xiu Xian-Wu(修显武) and Zhao Wen-Jing(赵文静) The properties of transparent conducting molybdenum-doped ZnO films grown by radio frequency magnetron sputtering 2012 Chin. Phys. B 21 066802
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