Simulation of plasma doping process by using the localized molecular dynamics method
Ji Hui-Hui(冀会辉)a)b), Yu Min(于民)a)†, Ren Li-Ming(任黎明)a), Zhang Xing(张兴)a), Huang Ru(黄如)a), and Zhang You-Guang(张有光)b)
a Department of Microelectronics, Peking University, Beijing 100871, China; b School of Electronic and Information Engineering, Beihang University, Beijing 100083, China
Abstract Plasma doping is the candidate for semiconductor doping. Accurate simulation of the doping technology is needed for the advanced integrated circuit manufacturing. In this paper, the plasma doping process simulation is performed by using the localized molecular dynamics method. Models that involve the statistics of the implanted compositions, angles and energies are developed. The effect of the model on simulation results is studied. The simulation results about the doping concentration profile are supported by experimental data.
Received: 27 February 2008
Revised: 05 May 2008
Accepted manuscript online:
(Impurity doping, diffusion and ion implantation technology)
Fund: Project supported by the National
Natural Science Foundation of China (Grant Nos 60676022, 60625403
and 90707006), and State Key Program for Basic Research of China
(Grant No 2006CB302701).
Cite this article:
Ji Hui-Hui(冀会辉), Yu Min(于民), Ren Li-Ming(任黎明), Zhang Xing(张兴), Huang Ru(黄如), and Zhang You-Guang(张有光) Simulation of plasma doping process by using the localized molecular dynamics method 2008 Chin. Phys. B 17 3428
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.
