Properties of n-Ge epilayer on Si substrate with in-situ doping technology

doi:10.1088/1674-1056/25/6/066601

Abstract

The properties of n-Ge epilayer deposited on Si substrate with in-situ doping technology in a cold-wall ultrahigh vacuum chemical vapor deposition (UHVCVD) system are investigated. The growth temperature of ～500℃ is optimal for the n-Ge growth in our equipment with a phosphorus concentration of ～10¹⁸ cm^-3. In the n-Ge epilayer, the depth profile of phosphorus concentration is box-shaped and the tensile strain of 0.12% confirmed by x-ray diffraction measurement is introduced which results in the red shift of the photoluminescence. The enhancements of photoluminescence intensity with the increase of the doping concentration are observed, which is consistent with the modeling of the spontaneous emission spectrum for direct transition of Ge. The results are of significance for guiding the growth of n-Ge epilayer with in-situ doping technology.

Keywords: in-situ doping technology germanium epitaxial growth

Received: 20 October 2015
Revised: 19 February 2016
Accepted manuscript online:

PACS:	66.30.J-	(Diffusion of impurities ?)
	61.72.uf	(Ge and Si)
	61.72.jd	(Vacancies)

Fund:

Project supported by the National Basic Research Program of China (Grant No. 2013CB632103), the National Key Technology Support Program of China (Grant No. 2015BAF24B01), the Natural Science Foundation of Fujian Province of China (Grant No. 2016J05147), the Key Sci-Tech Research and Development Platform of Fujian Province, China (Grant No. 2014H2002), the Provincial University Foundation of Fujian Province, China (Grant No. JK2013030), the Educational Youth Key Foundation of Fujian Province, China (Grant No. JA13210), and the Scientific Research Fund of Fujian University of Technology, China (Grant No. GY-Z14073).

Corresponding Authors: Shi-Hao Huang
E-mail: haoshihuang@qq.com

Cite this article:

Shi-Hao Huang(黄诗浩), Cheng Li(李成), Cheng-Zhao Chen(陈城钊), Chen Wang(王尘), Wen-Ming Xie(谢文明), Shu-Yi Lin(林抒毅), Ming Shao(邵明), Ming-Xing Nie(聂明星), Cai-Yun Chen(陈彩云) Properties of n-Ge epilayer on Si substrate with in-situ doping technology 2016 Chin. Phys. B 25 066601

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Properties of n-Ge epilayer on Si substrate with in-situ doping technology

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