Special Issue:
TOPICAL REVIEW — Silicene
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Growth mechanism and modification of electronic and magnetic properties of silicene |
Liu Hong-Sheng (柳洪盛), Han Nan-Nan (韩楠楠), Zhao Ji-Jun (赵纪军) |
Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Dalian University of Technology), Ministry of Education, Dalian 116024, China |
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Abstract Silicene, a monolayer of silicon atoms arranged in a honeycomb lattice, has been undergoing rapid development in recent years due to its superior electronic properties and its compatibility with mature silicon-based semiconductor technology. The successful synthesis of silicene on several substrates provides a solid foundation for the use of silicene in future microelectronic devices. In this review, we discuss the growth mechanism of silicene on an Ag (111) surface, which is crucial for achieving high quality silicene. Several critical issues related to the electronic properties of silicene are also summarized, including the point defect effect, substrate effect, intercalation of alkali metal, and alloying with transition metals.
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Received: 30 January 2015
Revised: 19 March 2015
Accepted manuscript online:
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PACS:
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73.22.-f
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(Electronic structure of nanoscale materials and related systems)
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73.20.At
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(Surface states, band structure, electron density of states)
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75.75.-c
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(Magnetic properties of nanostructures)
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68.55.A-
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(Nucleation and growth)
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Fund: Project supported by the National Natural Science Foundation of China (Grant No. 11134005). |
Corresponding Authors:
Zhao Ji-Jun
E-mail: zhaojj@dlut.edu.cn
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Cite this article:
Liu Hong-Sheng (柳洪盛), Han Nan-Nan (韩楠楠), Zhao Ji-Jun (赵纪军) Growth mechanism and modification of electronic and magnetic properties of silicene 2015 Chin. Phys. B 24 087303
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