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Roles of V/III ratio and mixture degree in GaN growth: CFD and MD simulation study |
Zhou An (周安)a b, Xiu Xiang-Qian (修向前)b, Zhang Rong (张荣)b, Xie Zi-Li (谢自力)b, Hua Xue-Mei (华雪梅)b, Liu Bin (刘斌)b, Han Ping (韩平)b, Gu Shu-Lin (顾书林)b, Shi Yi (施毅)b, Zheng You-Dou (郑有炓)b |
a School of Physics, Nanjing University, Nanjing 210093, China; b Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China |
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Abstract To understand the mechanism of Gallium nitride (GaN) film growth is of great importance for their potential applications. In this paper, we investigate the growth behavior of the GaN film by combining computational fluid dynamics (CFD) and molecular dynamics (MD) simulations. Both of the two simulations show that V/III mixture degree can have important impacts on the deposition behavior, and it is found that the more uniform the mixture is, the better the growth is. Besides, by using MD simulations, we illustrate the whole process of the GaN growth. Furthermore, we also find that the V/III ratio can affect the final roughness of the GaN film. When the V/III ratio is high, the surface of final GaN film is smooth. The present study provides the insights into GaN growth from the macroscopic and microscopic views, which may provide some suggestions on better experimental GaN preparation.
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Received: 20 April 2012
Revised: 12 July 2012
Accepted manuscript online:
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PACS:
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78.55.Cr
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(III-V semiconductors)
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47.11.+j
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02.70.Ns
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(Molecular dynamics and particle methods)
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Fund: Project supported by the National Basic Research Program of China (Grant No. 2011CB301900), the National High Technology Research and Development Program of China (Grant No. 2011AA03A103), the National Nature Science Foundation of China (Grant Nos. 60990311, 60820106003, 60906025, and 60936004), and the Natural Science Foundation of Jiangsu Province, China (Grant Nos. BK2011010, BK2010385, BK2009255, and BK2010178). |
Corresponding Authors:
Xiu Xiang-Qian
E-mail: xqxiu@nju.edu.cn
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Cite this article:
Zhou An (周安), Xiu Xiang-Qian (修向前), Zhang Rong (张荣), Xie Zi-Li (谢自力), Hua Xue-Mei (华雪梅), Liu Bin (刘斌), Han Ping (韩平), Gu Shu-Lin (顾书林), Shi Yi (施毅), Zheng You-Dou (郑有炓) Roles of V/III ratio and mixture degree in GaN growth: CFD and MD simulation study 2013 Chin. Phys. B 22 017801
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