Analytical results for the cluster size distribution in controlled deposition processes

doi:10.1088/1674-1056/19/2/026802

Abstract This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases.

Keywords: cluster growth deposition kinetic behaviour

Received: 13 March 2009
Revised: 08 April 2009
Accepted manuscript online:

PACS:	81.15.-z	(Methods of deposition of films and coatings; film growth and epitaxy)
	68.55.A-	(Nucleation and growth)
	68.43.Mn	(Adsorption kinetics ?)

Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 10775104, 10875086 and 10305009).

Cite this article:

Ke Jian-Hong(柯见洪), Chen Xiao-Shuang(陈效双), and Lin Zhen-Quan(林振权) Analytical results for the cluster size distribution in controlled deposition processes 2010 Chin. Phys. B 19 026802

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Analytical results for the cluster size distribution in controlled deposition processes

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