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Chin. Phys. B, 2010, Vol. 19(12): 127802    DOI: 10.1088/1674-1056/19/12/127802
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Prev   Next  

Optical characteristic and gap states distribution of amorphous SnO2:(Zn,In) film

Zhang Zhi-Guo(张治国)
Institute of Functional Material, Quanzhou Normal University, Quanzhou 362000, China
Abstract  In this paper the fabrication technique of amorphous SnO2:(Zn,In) film is presented. The transmittance and gap-states distribution of the film are given. The experimental results of gap-states distribution are compared with the calculated results by using the facts of short range order and lattice vacancy defect of the gap states theory. The distribution of gap state has been proved to be discontinuous due to the short-range order of amorphous structure.
Keywords:  transmittance      amorphous film      gap states distribution  
Received:  04 February 2010      Revised:  13 July 2010      Accepted manuscript online: 
PACS:  61.43.Dq (Amorphous semiconductors, metals, and alloys)  
  68.55.Ln (Defects and impurities: doping, implantation, distribution, concentration, etc.)  
  78.66.Li (Other semiconductors)  
  81.15.Ef  
Fund: Project supported by the Program A for Science and Technology of Education Bureau of Fujian Province of China (Grant No. JA08210).

Cite this article: 

Zhang Zhi-Guo(张治国) Optical characteristic and gap states distribution of amorphous SnO2:(Zn,In) film 2010 Chin. Phys. B 19 127802

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