Particle-in-Cell/Monte Carlo Collision simulation of planar DC magnetron sputtering
Zhao Hua-Yu(赵华玉) and Mu Zong-Xin(牟宗信)†
State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China
Abstract In this paper a numerical simulation of a planar DC magnetron discharge is performed with the Particle-in-Cell/Monte Carlo Collision (PIC/MCC) method. The magnetic field used in the simulation is calculated with finite element method according to experimental configuration. The simulation is carried out under the condition of gas pressure of 0.665 Pa and voltage magnitude of 400V. Typical results such as the potential distribution, charged particle densities, the discharge current density and ion flux onto the target are calculated. The erosion profile from the simulation is compared with the experimental data. The maximum erosion position corresponds to the place where the magnetic field lines are parallel to the target surface.
Received: 05 April 2007
Revised: 21 August 2007
Accepted manuscript online:
Fund: Project supported by the National
Science Found for Distinguished
Young Scholars of China (Grant No 50407015).
Cite this article:
Zhao Hua-Yu(赵华玉) and Mu Zong-Xin(牟宗信) Particle-in-Cell/Monte Carlo Collision simulation of planar DC magnetron sputtering 2008 Chin. Phys. B 17 1475
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