Abstract The RF electric field penetration and the power deposition into planar-type inductively coupled plasmas in low-pressure discharges have been studied by means of a self-consistent model which consists of Maxwell equations combined with the kinetic equation of electrons. The Maxwell equations are solved based on the expansion of the Fourier--Bessel series for determining the RF electric field. Numerical results show the influence of a non-Maxwellian electron energy distribution on the RF electric field penetration and the power deposition for different coil currents. Moreover, the two-dimensional spatial profiles of RF electric field and power density are also shown for different numbers of RF coil turns.
Received: 13 September 2006
Revised: 23 January 2007
Accepted manuscript online:
Fund: Project supported by
the National Natural Science Foundation of China (Grant Nos 10376003
and 10572035).
Cite this article:
Mao Ming(毛明), Wang Shuai(王帅), Dai Zhong-Ling(戴忠玲), and Wang You-Nian(王友年) RF electric field penetration and power deposition into nonequilibrium planar-type inductively coupled plasmas 2007 Chinese Physics 16 2044
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