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Chin. Phys. B, 2017, Vol. 26(7): 075203    DOI: 10.1088/1674-1056/26/7/075203

Influence of a centered dielectric tube on inductively coupled plasma source: Chamber structures and plasma characteristics

Zhen-Hua Bi(毕振华)1, Yi Hong(洪义)1, Guang-Jiu Lei(雷光玖)2, Shuai Wang(王帅)3, You-Nian Wang(王友年)4, Dong-Ping Liu(刘东平)1
1 Liaoning Key Laboratory of Optoelectronic Films & Materials, School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China;
2 Southwestern Institute of Physics, Chengdu 610041, China;
3 Physics Department, School of Science, Northeastern University, Shenyang 110819, China;
4 School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China
Abstract  A high-density RF ion source is an essential part of a neutral beam injector. In this study, the authors attempt to retrofit an original regular RF ion source reactor by inserting a thin dielectric tube through the symmetric axis of the discharge chamber. With the aid of this inner tube, the reactor is capable of generating a radial magnetic field instead of the original transverse magnetic field, which solves the E×B drift problem in the current RF ion source structure. To study the disturbance of the dielectric tube, a fluid model is introduced to study the plasma parameters with or without the internal dielectric tube, based on the inductively coupled plasma (ICP) reactor. The simulation results show that while introducing the internal dielectric tube into the ICP reactor, both the plasma density and plasma potential have minor influence during the discharge process, and there is good uniformity at the extraction region. The influence of the control parameters reveals that the plasma densities at the extraction region decrease first and subsequently slow down while enhancing the diffusion region.
Keywords:  neutral beam ion source      inductively coupled plasma (ICP)      fluid model  
Received:  30 November 2016      Revised:  13 March 2017      Accepted manuscript online: 
PACS:  52.65.-y (Plasma simulation)  
  52.50.Dg (Plasma sources)  
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos.11305028,11305032,and 11320101005).
Corresponding Authors:  Dong-Ping Liu     E-mail:

Cite this article: 

Zhen-Hua Bi(毕振华), Yi Hong(洪义), Guang-Jiu Lei(雷光玖), Shuai Wang(王帅), You-Nian Wang(王友年), Dong-Ping Liu(刘东平) Influence of a centered dielectric tube on inductively coupled plasma source: Chamber structures and plasma characteristics 2017 Chin. Phys. B 26 075203

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