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Chinese Physics, 2003, Vol. 12(2): 218-221    DOI: 10.1088/1009-1963/12/2/318
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES Prev   Next  

Atomic hydrogen induced step bunching and fabrication of quantum wire arrays on GaAs (311)A substrate by molecular beam epitaxy

Zhou Da-Yong (周大勇), Lan Qing (澜清), Kong Yun-Chuan (孔云川), Miao Zhen-Hua (苗振华), Feng Song-Lin (封松林), Niu Zhi-Chuan (牛智川)
State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
Abstract  Atomic hydrogen assisted molecular beam epitaxy (MBE) is a novel type of epitaxial growth of nanostructures. The GaAs (311)A surface naturally forms one-dimensional step arrays by step bunching along the direction of 〈-233〉 and the space period is around 40nm. The step arrays extend over several μm without displacement. The InGaAs quantum wire arrays are grown on the step arrays as the basis. Our results may prompt further development of more uniform quantum wire and quantum dot arrays.
Keywords:  molecular beam epitaxy (MBE) step bunching      InGaAs      quantum wire  
Received:  16 May 2002      Revised:  08 July 2002      Accepted manuscript online: 
PACS:  81.07.Vb (Quantum wires)  
  81.16.-c (Methods of micro- and nanofabrication and processing)  
Fund: Project supported by the National Science Foundation of China (Grant Nos 60176006 and 60025410) and by the Nano Science and Technology Project of Chinese Academy of Sciences.

Cite this article: 

Zhou Da-Yong (周大勇), Lan Qing (澜清), Kong Yun-Chuan (孔云川), Miao Zhen-Hua (苗振华), Feng Song-Lin (封松林), Niu Zhi-Chuan (牛智川) Atomic hydrogen induced step bunching and fabrication of quantum wire arrays on GaAs (311)A substrate by molecular beam epitaxy 2003 Chinese Physics 12 218

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