LASER MOLECULAR BEAM EPITAXY SYSTEM AND ITS KEY TECHNOLOGIES
Yang Guo-zhen (杨国桢)ab, Lü Hui-bin(吕惠宾)a, Zhou Yue-liang (周岳亮)ab, Lei Zhen-lin (雷震霖)c ，Chen Zheng-hao (陈正豪)ab
a Laboratory of Optical Physics, Institute of Physics, Academia Sinica, Beijing 100080, China; b Centre for Condensed Matter Physics, Academia Sinica, Beijing 100080, China; c Shenyang Scientific Instrument Development Center, Academia Sinica, Shenyang 110003, China
Abstract The laser molecular beam epitaxy system and its key technologies have been successfully developed in China. Atomically regulated unit-cell by unit-cell homoepitaxial SrTiO3 (STO) and heteroepitaxial BaTiO3 (BTO) films and STO/BTO superlattices were fabricated on STO (100) substrates by the laser molecular beam epitaxy. The fine streak patterns and more than 1000 cycles of undamping intensity oscillation were obtained by using in-situ reflection high-energy electron diffraction. The surfaces of films are atomically smooth.
Received: 27 April 1998
Revised: 27 May 1998
Accepted manuscript online:
PACS:
81.15.Hi
(Molecular, atomic, ion, and chemical beam epitaxy)
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