Abstract We have applied the layer-by-layer deposition technique to the growth of nano-crystalline silicon films by varying the hydrogen plasma exposure time. The tailoring effect of hydrogen plasma has been studied, The novel optical and electronic proper-ties of these films have also been reported.
Received: 04 May 1993
Accepted manuscript online:
PACS:
81.16.-c
(Methods of micro- and nanofabrication and processing)
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