Hexagonal boron nitride hollow capsules with collapsed surfaces: Chemical vapor deposition with single-source precursor ammonium fluoroborate

doi:10.1088/1674-1056/25/7/078107

Abstract

SBA-15 (mesoporous SiO₂) is used to stabilize and transfer F^- in the NH₄BF₄ CVD reaction for the first time, and a large-scale crystalline h-BN phase can be prepared. We successfully fabricate hollow h-BN capsules with collapsed surfaces in our designed NH₄BF₄ CVD system. Optimum temperature conditions are obtained, and a detailed formation mechanism is further proposed. The successful SBA-15-assisted NH₄BF₄ CVD route is of importance and enriches the engineering technology in the h-BN single-source CVD reaction.

Keywords: hollow capsule hexagonal boron nitride chemical vapor deposition ammonium fluoroborate

Received: 10 January 2016
Revised: 25 February 2016
Accepted manuscript online:

PACS:	81.07.-b	(Nanoscale materials and structures: fabrication and characterization)
	81.05.Je	(Ceramics and refractories (including borides, carbides, hydrides, nitrides, oxides, and silicides))
	81.15.Gh	(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
	78.30.Hv	(Other nonmetallic inorganics)

Fund:

Project supported by the National Natural Science Foundation of China (Grant Nos. 51332005, 51372066, 51172060, 51202055, and 21103056).

Corresponding Authors: Yanming Xue, Chengchun Tang
E-mail: XUE.Yanming@nims.go.jp;tangcc@hebut.edu.cn

Cite this article:

Xiaopeng Li(李肖鹏), Jun Zhang(张军), Chao Yu(郁超), Xiaoxi Liu(刘晓喜), Saleem Abbas, Jie Li(李杰), Yanming Xue(薛彦明), Chengchun Tang(唐成春) Hexagonal boron nitride hollow capsules with collapsed surfaces: Chemical vapor deposition with single-source precursor ammonium fluoroborate 2016 Chin. Phys. B 25 078107

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Hexagonal boron nitride hollow capsules with collapsed surfaces: Chemical vapor deposition with single-source precursor ammonium fluoroborate

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