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Chin. Phys. B, 2016, Vol. 25(10): 108503    DOI: 10.1088/1674-1056/25/10/108503

A two-dimensional analytical modeling for channel potential and threshold voltage of short channel triple material symmetrical gate Stack (TMGS) DG-MOSFET

Shweta Tripathi
Department of Electronics & Communication Engineering, Motilal Nehru National Institute of Technology, Allahabad-211004, India
Abstract  In the present work, a two-dimensional(2D) analytical framework of triple material symmetrical gate stack (TMGS) DG-MOSFET is presented in order to subdue the short channel effects. A lightly doped channel along with triple material gate having different work functions and symmetrical gate stack structure, showcases substantial betterment in quashing short channel effects to a good extent. The device functioning amends in terms of improved exemption to threshold voltage roll-off, thereby suppressing the short channel effects. The encroachments of respective device arguments on the threshold voltage of the proposed structure are examined in detail. The significant outcomes are compared with the numerical simulation data obtained by using two-dimensional (2D) ATLASTM device simulator to affirm and formalize the proposed device structure.
Keywords:  triple material symmetrical gate stack (TMGS) DG MOSFET      gate stack      short channel effect      drain induced barrier lowering      threshold voltage  
Received:  12 May 2016      Revised:  17 June 2016      Published:  05 October 2016
PACS:  85.30.Tv (Field effect devices)  
  85.30.-z (Semiconductor devices)  
  73.40.Qv (Metal-insulator-semiconductor structures (including semiconductor-to-insulator))  
  12.39.Pn (Potential models)  
Corresponding Authors:  Shweta Tripathi     E-mail:

Cite this article: 

Shweta Tripathi A two-dimensional analytical modeling for channel potential and threshold voltage of short channel triple material symmetrical gate Stack (TMGS) DG-MOSFET 2016 Chin. Phys. B 25 108503

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