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Chin. Phys. B, 2019, Vol. 28(1): 017303    DOI: 10.1088/1674-1056/28/1/017303

Investigation and active suppression of self-heating induced degradation in amorphous InGaZnO thin film transistors

Dong Zhang(张东)1, Chenfei Wu(武辰飞)1, Weizong Xu(徐尉宗)1, Fangfang Ren(任芳芳)1, Dong Zhou(周东)1, Peng Yu(于芃)2, Rong Zhang(张荣)1, Youdou Zheng(郑有炓)1, Hai Lu(陆海)1
1 School of Electronic Science and Engineering, Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, Nanjing University, Nanjing 210093, China;
2 State Grid Shandong Electric Power Research Institute, Jinan 250001, China

Self-heating effect in amorphous InGaZnO thin-film transistors remains a critical issue that degrades device performance and stability, hindering their wider applications. In this work, pulsed current-voltage analysis has been applied to explore the physics origin of self-heating induced degradation, where Joule heat is shortly accumulated by drain current and dissipated in repeated time cycles as a function of gate bias. Enhanced positive threshold voltage shift is observed at reduced heat dissipation time, higher drain current, and increased gate width. A physical picture of Joule heating assisted charge trapping process has been proposed and then verified with pulsed negative gate bias stressing scheme, which could evidently counteract the self-heating effect through the electric-field assisted detrapping process. As a result, this pulsed gate bias scheme with negative quiescent voltage could be used as a possible way to actively suppress self-heating related device degradation.

Keywords:  amorphous InGaZnO thin-film transistor      self-heating effect      threshold voltage shift      pulsed negative gate bias  
Received:  27 July 2018      Revised:  26 October 2018      Accepted manuscript online: 
PACS:  73.50.-h (Electronic transport phenomena in thin films)  
  73.50.Gr (Charge carriers: generation, recombination, lifetime, trapping, mean free paths)  
  73.61.Jc (Amorphous semiconductors; glasses)  

Project supported by the National Key R&D Program of China (Grant No. 2016YFB0400100), the National Natural Science Foundation of China (Grant No. 91850112), the Natural Science Foundation of Jiangsu Province, China (Grant No. BK20161401), the Priority Academic Program Development of Jiangsu Higher Education Institutions, China, the Science and Technology Project of State Grid Corporation of China (Grant No. SGSDDK00KJJS1600071), and the Fundamental Research Funds for the Central Universities, China (Grant No. 14380098).

Corresponding Authors:  Weizong Xu, Hai Lu     E-mail:;

Cite this article: 

Dong Zhang(张东), Chenfei Wu(武辰飞), Weizong Xu(徐尉宗), Fangfang Ren(任芳芳), Dong Zhou(周东), Peng Yu(于芃), Rong Zhang(张荣), Youdou Zheng(郑有炓), Hai Lu(陆海) Investigation and active suppression of self-heating induced degradation in amorphous InGaZnO thin film transistors 2019 Chin. Phys. B 28 017303

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