Evolution of the structural and optical properties of silver oxide films with different stoichiometries deposited by direct-current magnetron reactive sputtering

doi:10.1088/1674-1056/21/6/066101

Abstract Nitrogen doping of silver oxide (Ag_xO) film is necessary for its application in transparent conductive film and diodes because intrinsic Ag_xO film is a p-type semiconductor with poor conductivity. In this work, a series of Ag_xO films is deposited on glass substrates by direct-current magnetron reactive sputtering at different flow ratios (FRs) of nitrogen to O₂. Evolutions of the structure, the reflectivity, and the transmissivity of the film are studied by X-ray diffractometry and sphectrophotometry, respectively. The specular transmissivity and the specular reflectivity of the film decreasing with FR increasing can be attributed to the evolution of the phase structure of the film. The nitrogen does not play the role of an acceptor dopant in the film deposition.

Keywords: silver oxide film nitrogen doping optical properties magnetron reactive sputtering

Received: 28 September 2011
Revised: 25 October 2011
Accepted manuscript online:

PACS:	61.05.cp	(X-ray diffraction)
	78.66.-w	(Optical properties of specific thin films)
	81.15.Cd	(Deposition by sputtering)

Fund: Project supported by the National Natural Science Foundation of China (Grant No. 60807001), the Foundation of Henan Educational Committee, China (Grant No. 2010A140017), the College Young Teachers Program of Henan Province and the Graduate Innovation Fund of Zhengzhou University (Grant No. 11L10102).

Corresponding Authors: Gao Xiao-Yong
E-mail: xygao@zzu.edu.cn

Cite this article:

Zhao Meng-Ke(赵孟珂), Liang Yan(梁艳), Gao Xiao-Yong(郜小勇), Chen Chao(陈超), Chen Xian-Mei(陈先梅), and Zhao Xian-Wei(赵显伟) Evolution of the structural and optical properties of silver oxide films with different stoichiometries deposited by direct-current magnetron reactive sputtering 2012 Chin. Phys. B 21 066101

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Evolution of the structural and optical properties of silver oxide films with different stoichiometries deposited by direct-current magnetron reactive sputtering

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