Molecular dynamic simulations of surface morphology and pulsedlaser deposition growth of lithium niobate thin filmson silicon substrate
Liu Yue (刘悦)a, Zhu Hao-Nan (朱浩楠)b, Pei Zi-Dong (裴子栋)a, Kong Yong-Fa (孔勇发)a c, Xu Jing-Jun (许京军)a
a The MOE Key Laboratory of Weak-Light Nonlinear Photonics and TEDA Applied Physics School, Nankai University, Tianjin 300457, China; b School of Mathematical Science, Peking University, Beijing 100871, China; c R & D Center, Taishan Sports Industry Group, Leling 253600, China
Abstract The molecular dynamic simulation of lithium niobate thin films deposited on silicon substrate is carried out by using the dissipative particle dynamics method. The simulation results show that the Si (111) surface is more suitable for the growth of smooth LiNbO3 thin films compared to the Si(100) surface, and the optimal deposition temperature is around 873 K, which is consistent with the atomic force microscope results. In addition, the calculation molecular number is increased to take the electron spins and other molecular details into account.
A new direct band gap silicon allotrope o-Si32 Xin-Chao Yang(杨鑫超), Qun Wei(魏群), Mei-Guang Zhang(张美光), Ming-Wei Hu(胡明玮), Lin-Qian Li(李林茜), and Xuan-Min Zhu(朱轩民). Chin. Phys. B, 2022, 31(2): 026104.
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