INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
Prev
Next
|
|
|
Simulation and experimental study of high power microwave damage effect on AlGaAs/InGaAs pseudomorphic high electron mobility transistor |
Yu Xin-Hai (于新海), Chai Chang-Chun (柴常春), Liu Yang (刘阳), Yang Yin-Tang (杨银堂), Xi Xiao-Wen (席晓文) |
Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China |
|
|
Abstract The high power microwave (HPM) damage effect on the AlGaAs/InGaAs pseudomorphic high electron mobility transistor (pHEMT) is studied by simulation and experiments. Simulated results suggest that the HPM damage to pHEMT is due to device burn-out caused by the emerging current path and strong electric field beneath the gate. Besides, the results demonstrate that the damage power threshold decreases but the energy threshold slightly increases with the increase of pulse-width, indicating that HPM with longer pulse-width requires lower power density but more energy to cause the damage to pHEMT. The empirical formulas are proposed to describe the pulse-width dependence. Then the experimental data validate the pulse-width dependence and verify that the proposed formula P = 55τ-0.06 is capable of quickly and accurately estimating the HPM damage susceptibility of pHEMT. Finally the interior observation of damaged samples by scanning electron microscopy (SEM) illustrates that the failure mechanism of the HPM damage to pHEMT is indeed device burn-out and the location beneath the gate near the source side is most susceptible to burn-out, which is in accordance with the simulated results.
|
Received: 29 October 2014
Revised: 14 November 2014
Accepted manuscript online:
|
PACS:
|
85.30.Tv
|
(Field effect devices)
|
|
84.40.-x
|
(Radiowave and microwave (including millimeter wave) technology)
|
|
Fund: Project supported by the National Basic Research Program of China (Grant No. 2014CB339900) and the National Natural Science Foundation of China (Grant No. 60776034). |
Corresponding Authors:
Yu Xin-Hai
E-mail: xhyu@stu.xidian.edu.cn
|
Cite this article:
Yu Xin-Hai (于新海), Chai Chang-Chun (柴常春), Liu Yang (刘阳), Yang Yin-Tang (杨银堂), Xi Xiao-Wen (席晓文) Simulation and experimental study of high power microwave damage effect on AlGaAs/InGaAs pseudomorphic high electron mobility transistor 2015 Chin. Phys. B 24 048502
|
[1] |
Mahon S J, Dadello A, Fattorini A P, Fattorini A P, Bessemoulin A and Harvey J T 2008 IEEE Microw. Symp. Dig., 2008 MTT-S International, 15-20 June, 2008, Atlanta, GA, p. 855
|
[2] |
Alvaro M, Caddemi A, Crupi G and Donato N 2005 Microelectron. J. 36 732
|
[3] |
Baksht T, Solodky S, Leibovitch M, Bunin G and Shapira Y 2003 IEEE Trans. Electron Dev. 50 479
|
[4] |
Tan C L, Wang H and Radhakrishnan K 2007 IEEE Trans. Dev. Mater. Reliab. 7 488
|
[5] |
Chou Y C, Lai R, Block T R, Sharma A, Kan Q, Leung D L, Eng D and Oki A 2005 IEEE Trans. Microw. Theory Tech. 53 3398
|
[6] |
Bäckström M G and Lövstrand K G 2004 IEEE Trans. EMC 46 396
|
[7] |
Ren X R, Chai C C, Ma Z Y and Yang Y T 2013 J. Xidian University 40 36 (in Chinese)
|
[8] |
Ren X R, Chai C C, Ma Z Y, Yang Y T, Qiao L P, Shi C L and Ren L H 2013 J. Semicond. 34 044004
|
[9] |
Ma Z Y, Chai C C, Ren X R, Yang Y T and Chen B 2012 Acta Phys. Sin. 61 078501 (in Chinese)
|
[10] |
Ma Z Y, Chai C C, Ren X R, Yang Y T, Chen B and Zhao Y B 2012 Chin. Phys. B 21 058502
|
[11] |
Ma Z Y, Chai C C, Ren X R, Yang Y T, Chen B, Song K and Zhao Y B 2012 Chin. Phys. B 21 098502
|
[12] |
Ma Z Y, Chai C C, Ren X R, Yang Y T, Zhao Y B and Qiao L P 2013 Chin. Phys. B 22 028502
|
[13] |
Yu X H, Chai C C, Ren X R, Yang Y T, Xi X W and Liu Y 2014 J. Semicond. 35 084011
|
[14] |
Integrated Systems Engineering Corp 2004 ISE-TCAD Dessis Simulation User's Manual, Zurich, Switzerland, pp. 15, 195
|
[15] |
Kim K and Iliadis A A 2010 Solid-State Electron. 54 18
|
[16] |
Chai C C, Ma Z Y, Ren X R, Yang Y T, Zhao Y B and Yu X H 2013 Chin. Phys. B 22 068502
|
[17] |
Wunsch D C and Bell R R 1968 IEEE Trans. Nucl. Sci. 15 244
|
[18] |
Tasca D M 1970 IEEE Trans. Nucl. Sci. 17 364
|
[19] |
Brown W D 1972 IEEE Trans. Nucl. Sci. 19 68
|
[20] |
Chai C C, Yang Y T, Zhang B, Leng P, Yang Y and Rao W 2009 Semicond. Sci. Technol. 24 035003
|
No Suggested Reading articles found! |
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
Altmetric
|
blogs
Facebook pages
Wikipedia page
Google+ users
|
Online attention
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.
View more on Altmetrics
|
|
|